Facial mask

A face mask and synthetic resin technology, applied in the direction of heating appliances for treatment, cooling appliances for treatment, types of packaging items, etc., to achieve the effects of easy restoration, prevention of facial burns, and skin beautification

Inactive Publication Date: 2015-09-09
郑圭成 +1
View PDF3 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this method is effective, it has the limitation that it cannot be used after the oxidation reaction is completed.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Facial mask
  • Facial mask
  • Facial mask

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0052] For the facial mask made according to the present invention, it needs to be described in detail with reference examples. There can be many kinds of examples, which can help us better understand the purpose, characteristics and advantages of this study.

[0053] Figure 3a Show the oblique view of the facial mask made by the present invention. Figure 3b It shows an oblique view of the disassembled facial mask made by the present invention.

[0054] Facial mask made according to the present invention such as Figure 3a and 3bAs shown, the woven mat 10 comprising carbon liquid C infiltrated into the bottom layer to dry while forming a face model, and the positive electrode 21 and the negative electrode 22 placed on both sides of the woven mat 10 are placed between the positive and negative electrodes 21 and 22 and pasted on the woven mat 10 maintains the synthetic resin foam cream 30 of facial elasticity and sticks under the weaving pad 10, maintains the synthetic res...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a facial mask including: using dry carbon liquid, a weaving pad cut according to a feature, a positive electrode and a negative electrode arranged under the weaving pad, synthetic resin foam cream pasted on the weaving pad and maintaining the facial elasticity, a synthetic resin pad pasted under the weaving pad and maintaining the skin touch, and a power supply part for supplying the positive power supply and the negative power supply. The inventive carbon liquid is permeated into the weaving pad to dry the weaving pad, thereby providing power supply for the positive electrode and the negative electrode. At this time the dry carbon liquid plays the role of resistance to heat. This heat promotes pore to open and promotes blood circulation, so that the function of various humectants is played to the full extent.

Description

technical field [0001] The invention relates to a facial mask. The facial mask uses a beauty temperature to make facial skin beauty for men, women and children safer, simpler and more convenient. Background technique [0002] Recently, regardless of men, women and children, the pursuit of beauty has been increasing, especially the beauty of facial skin. [0003] Figure 1a It is an exploded perspective view of a mask and a fiber heating element of the prior art patent document 1 (Republic of Korea Utility Model Registration No. 0466565, mask). Figure 1b It is a joint cross-sectional view of the mask and the fiber heating element of the prior art patent document 1. Figure 1c It is a structural cross-sectional view of a fiber heating element applied to Patent Document 1 of the prior art. [0004] The facial mask in the prior art patent document 1 is as shown in the figure Figure 1a as well as Figure 1c , select one of the materials of pure cotton, non-woven fabric, and ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/02A61Q19/00A61F7/02
CPCA45D44/002A45D44/22A61K8/0212A61N1/0404A61N1/328
Inventor 金辉山
Owner 郑圭成
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products