Gripping device for transporting slide trays

A grabbing device and carrier disc technology, which is applied in gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of lack of stability and safety, low efficiency, inconvenient operation, etc., and achieve a simple and reliable structure. , The effect of stable and safe operation, uniform circumferential force

CN105624649BActive Publication Date: 2018-03-20广东众元半导体科技有限公司
5 Cites 0 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Publication Date
2018-03-20

Smart Images

  • Figure 1
    Figure 1
  • Figure 2
    Figure 2
  • Figure 3
    Figure 3
Patent Text Reader

Abstract

The invention discloses a gripping device for conveying wafer carrying discs of chemical vapor deposition equipment. The gripping device mainly comprises a base, a guide rod, a rotation arm and a mechanical arm. According to the gripping device for conveying the wafer carrying discs, the circumferential stress of the wafer carrying discs is more uniform in the manner that the wafer carrying discs are evenly hoisted in the circumferential direction, stable conveying of the wafer carrying discs and wafers in the wafer carrying discs is guaranteed, and in addition, by means of reverse application of a swinging guide rod mechanism, the gripping and placing actions of the mechanical arm are achieved. The structure is simple and reliable, operation is more stable and safer compared with manual operation, and the production efficiency is improved.
Need to check novelty before this filing date? Find Prior Art

Description

technical field

[0001] The invention relates to the field of semiconductor material manufacturing devices, in particular to a grabbing device used for conveying a carrier disc of a chemical vapor deposition device. Background technique

[0002] Chemical vapor deposition (CVD) technology integrates precision machinery, semiconductor materials, vacuum electronics, fluid mechanics, optics, chemistry, and computer disciplines. It is a high-end semiconductor material with high automation, high price and high technology integration. Special equipment for device manufacturing. As an ideal method for the epitaxial growth of compound semiconductor materials, chemical vapor deposition equipment has the characteristics of high quality, good stability, good repeatability, flexible process, and large-scale mass production. It has become the key core for the production of semiconductor optoelectronic devices and microwave devices in the industry. The equipment has broad application prosp...

Examples

Embodiment Construction

[0014] Embodiments of the present invention are further described below in conjunction with the accompanying drawings, Figure 1 to Figure 4 is a schematic illustration of the operation of an embodiment device according to the present invention. It should be understood that the disclosed Figure 1 to Figure 4 Emphasis is placed on illustrating components of devices according to embodiments of the present invention, that is, these figures are not intended to illustrate every single component of the device of the present invention.

[0015] Such as figure 1 , figure 2 , image 3 and Figure 4 As shown in the figure, a grabbing device for chemical vapor deposition equipment transporting the carrier tray mainly includes a base 1, a guide rod 2, a rotary arm 3, and a manipulator 4. The guide rod 2 is fixedly installed on the base 1, and the rotary arm 3 is installed On the guide rod 2, the end of the rotary arm 3 is equipped with a manipulator 4 for grabbing and placing the s...