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A technology of natural plants and facial masks, applied in the field of facial masks containing natural plants, can solve problems such as inducing other diseases, roughness, and damaging the sebum film of the skin
Inactive Publication Date: 2017-01-04
WUXI QIBAO CLEANING AGENT CO LTD
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Summary
Abstract
Description
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Problems solved by technology
There are many types of facial masks currently on the market, but most of them are petrochemical products, containing preservatives, bactericides, spices, synthetic pigments, etc. These chemical components that are
Method used
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Examples
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Example Embodiment
[0007] Example 1
[0008] A facial mask containing natural plants, in parts by weight, consists of the following components:
[0009] Bitter gourd juice 20, mung bean powder 20, tea tree essential oil 1, wheat germ oil 3, honey 5.
[0010] In the above-mentioned technical scheme, the specific production steps of the described facial mask containing natural plants are as follows:
[0011] (1) Mix bitter gourd juice and mung bean powder and stir well;
[0012] (2) Finally, add the remaining ingredients and mix well and apply to the cleansed face, avoiding the eyes and lips;
[0013] (3) After about 20 minutes, wash off with lukewarm water. Apply once or twice a week.
Example Embodiment
[0014] Example 2
[0015] A facial mask containing natural plants, in parts by weight, consists of the following components:
[0016] Bitter gourd juice 30, mung bean powder 25, tea tree essential oil 2, wheat germ oil 5, honey 6.
[0017] In the above-mentioned technical scheme, the specific production steps of the described facial mask containing natural plants are as follows:
[0018] (1) Mix bitter gourd juice and mung bean powder and stir well;
[0019] (2) Finally, add the remaining ingredients and mix well and apply to the cleansed face, avoiding the eyes and lips;
[0020] (3) After about 20 minutes, wash off with lukewarm water. Apply once or twice a week.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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PUM
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Abstract
The invention relates to a facial mask containing natural plants. The facial mask consists of the following component in parts by weight: 20-30 parts of juice of momordicae charantiae, 20-25 parts of mung bean flour, 1-2 parts of tea tree essential oil, 3-5 parts of wheatgerm oil and 5-6 parts of honey. The facial mask disclosed has the beneficial effects that the facial mask is natural and environmentally friendly, and the prescription of the facial mask is free from any irritation; the facial mask has an effect on effectively disinfecting and sterilizing bacteria; and the facial mask is especially suitable for preventing and treating skin with acne.
Description
technical field [0001] The invention belongs to the field of daily skin care products, in particular to a facial mask containing natural plants. Background technique [0002] Under the influence of multiple internal and external aging factors, the skin becomes dry, loose, loses elasticity, wrinkles, and gradually loses its youthful radiance. At present, there are many kinds of facial masks on the market, but most of them are petrochemical products, containing preservatives, fungicides, fragrances, synthetic pigments, etc. These chemical components that are unfavorable to the human body will damage the sebum film of the skin, and long-term use will make the skin gradually gradually It can lead to roughness, allergic reactions, etc., and more serious can induce other diseases. SUMMARY OF THE INVENTION [0003] In view of the above shortcomings, the present invention provides a facial mask containing natural plants, which can effectively disinfect and sterilize, and is espec...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information
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