Cultivation method for promoting expansion of bletilla striata tubers and bletilla striata tubers cultivated therefrom
A cultivation method and technology of bletilla striata, applied in the field of bletilla striata, can solve the problems of increasing cost, reducing drug efficacy, enriching fertilizer, etc., and achieve the effects of increasing yield per mu, improving economic benefits, and promoting expansion
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0048] In March, plow on a relatively flat land, and dig out a planting ditch with a width of 50 cm and a depth of 80 cm. The interval width of each planting ditch is 25 cm, and lay 20 cm thick stones and river sand at the bottom of the planting ditch. The mixed drainage bottom layer, and the surface of the drainage bottom layer is smoothed out, and the isolation planting frame 100 with reverse osmosis membrane is laid on the top of the drainage bottom layer, and the stacking cavity mixed with compost and perlite is piled up in the stacking cavity of the isolation planting frame 100. The soil is formed into a planting ridge with a height of 10 cm. The compost application rate standard is 500 kg per mu, and a drip irrigation pipe is buried at a position 3 cm away from the surface of the planting ridge. A planting shed is also arranged on the cultivated land, and a spray humidifier and a greenhouse heating heater are arranged in the planting shed.
[0049] The Bletilla striata t...
Embodiment 2
[0057] In April, plow on a relatively flat land, and dig out a planting ditch with a width of 80 cm and a depth of 40 cm. bottom layer, and the surface of the drainage bottom layer is arranged and leveled, and the isolated planting frame 100 with reverse osmosis membrane is laid on the top of the drainage bottom layer, and the soil mixed with livestock manure and vermiculite is piled up in the stacking cavity of the isolated planting frame 100 and A planting ridge with a height of 15 cm is formed, and the application rate of livestock manure is 800 kg per mu, and a drip irrigation pipe is buried at a position 5 cm away from the surface of the planting ridge. A planting shed is also arranged on the cultivated land, and a spray humidifier and a greenhouse heating heater are arranged in the planting shed.
[0058] The Bletilla striata tubers with bud eyes are selected and cut to obtain the sowing tubers containing 3 bud eyes, and the sowing tubers are soaked in KH containing 4% b...
Embodiment 3
[0066] In April, plowing was carried out on a relatively flat land, and a planting ditch with a width of 65 cm and a depth of 60 cm was dug out. The interval width of each planting ditch was 30 cm. Drain the bottom layer, and level the surface of the drainage bottom layer, lay an isolated planting frame 100 with a reverse osmosis membrane on the top of the drainage bottom layer, and accumulate and mix manure, vermiculite and perlite in the stacking cavity of the isolated planting frame 100 The soil forms a planting ridge with a height of 12 cm, and the application rate of manure is 650 kg per mu, and a drip irrigation pipe is buried at a position 4 cm from the surface of the planting ridge. There are also planting sheds on the cultivated land, and spray humidifiers and industrial gas heaters are installed in the planting sheds.
[0067] The bletilla striata tubers with bud eyes are selected and divided to obtain seed tubers containing 2 bud eyes, and the seed tubers are soaked...
PUM
Property | Measurement | Unit |
---|---|---|
depth | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
height | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com