Screw assembly and radio frequency processing device using same

Abstract

The invention provides a screw assembly, including a clamping plate and a stainless steel shrapnel. The clamping plate comprises an upper layer clamping plate, a lower layer clamping plate, and a clamping plate opening between the upper layer clamping plate and the lower layer clamping plate. A screw hole holding a screw is arranged through the clamping plate. The stainless steel shrapnel is in the clamping plate opening. The stainless steel shrapnel is provided with a round opening corresponding to the screw hole. The region of the stainless steel shrapnel, close to the round opening, and theregion close to the edge are in different planes. An acute angle is between the region of the stainless steel shrapnel, close to the round opening, and the upper layer clamping plate, and an acute angle is between the region of the stainless steel shrapnel, close to the edge region, and the lower layer clamping plate. The screw assembly is provided with an anti-loose mechanism, and can effectively ensure good contact of the screw assembly and a screw. The screw assembly ensures path stability of a radio frequency current loop, to prevent impedance of the radio frequency loop from changing, soas to ensure that a radio frequency discharge condition would not drift.

Description

technical field [0001] The invention relates to the technical field of radio frequency, in particular to the technical field of a screw assembly used in a radio frequency processing device to ensure the stability of radio frequency signals. Background technique [0002] In the field of radio frequency processing technology, especially in the technology involving plasma etching, in order to ensure that the plasma etches the substrate with strong directionality, it is usually required to feed a higher power radio frequency signal into the plasma processing device To provide sufficient bias voltage, under high-power process conditions, a large radio-frequency current will be generated in the plasma processing device. The bias radio frequency signal is usually applied to the base for supporting the substrate. In order to form a current loop, the plasma processing device also needs to provide a channel capable of ensuring that the radio frequency current forms a current loop. ...

AI Technical Summary

Problems solved by technology

However, since the plasma processing device generates a large amount of heat during the working process, the aluminum screws and the aluminum gaskets are more likely to loosen during the thermal cycle, and it is difficult to set the anti-loosening device due to the insufficient hardness of the alumin...

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