Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Novel dual-polarized low-pass band-sucking frequency selective structure

A frequency-selective, dual-polarization technology, applied in the field of stealth radome, can solve the problem of band-absorbing type that has not been reported yet, and achieve the effect of simple manufacture, wide absorbing band, and reduced RCS

Active Publication Date: 2020-06-16
HANGZHOU DIANZI UNIV
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The frequency selective structures with absorbing properties that have been reported so far are all band-pass type, and band-absorbing type has not been reported yet.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Novel dual-polarized low-pass band-sucking frequency selective structure
  • Novel dual-polarized low-pass band-sucking frequency selective structure
  • Novel dual-polarized low-pass band-sucking frequency selective structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0027] The present invention is further analyzed below in conjunction with specific examples.

[0028] The present invention adopts a single-ring reflection plane, combined with a single-ring circuit analog absorber, to build a dual-polarization low-pass band suction frequency selection structure, which can realize low insertion loss in the low-frequency pass-band, and generate a wider near-high frequency absorbing band.

[0029] like figure 1 As shown, the dual-polarized low-pass band-absorbing frequency selective structure is a periodic structure, and each structural unit includes a wave-absorbing surface and a band-stop reflecting surface;

[0030] like figure 2 As shown, the wave-absorbing surface includes a Rogers5880 first dielectric substrate 1 with a thickness of 0.508 mm. The left surface of the dielectric substrate 1 is coated with a first metal ring 3. The metal ring 3 overlaps with the center of the dielectric substrate 1. The four sides of the metal ring 3 A t...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a novel dual-polarization low-passband absorbing type frequency selection structure. A traditional wave absorbing type frequency selection structure uses a bandpass type frequency selection structure which is limited in pass bandwidth and hard to cover low frequency. The structure of the invention uses monocyclic reflection plane together with a monocyclic circuit simulated absorber, so that low insertion loss can be realized within the low frequency passband, and a relative wide wave absorbing belt is generated near high frequency.

Description

technical field [0001] The invention belongs to the field of microwave technology, and relates to a dual-polarized low-pass band-absorbing frequency selection structure, which can be used as a stealth radome for low-frequency (VHF / UHF) antennas. Its potential application scenarios include integrated communication masts for warships, etc. Background technique [0002] In current military applications, using frequency selective surfaces and frequency selective structures as radomes is one of the effective ways to reduce the radar cross section, and this method can effectively improve the stealth performance of combat platforms. [0003] The frequency selective surface is essentially a spatial filter, which can only filter electromagnetic waves such as specific frequency bands, polarization modes, and incident angles, but cannot absorb electromagnetic waves. Therefore, for the radome developed based on the frequency selective surface, the detection wave can only be reflected an...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01P1/20H01Q15/00H01Q17/00H01Q1/42H01Q1/34
CPCH01P1/20H01Q1/34H01Q1/42H01Q15/0013H01Q15/0053H01Q17/008
Inventor 罗国清俞伟良俞钰峰张晓红代喜望
Owner HANGZHOU DIANZI UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com