Preparing method of after-sun repair mask containing broadleaf holly leaf extracts

A technology of Kudingcha extract and post-sun repairing mask, which is applied in the direction of medical preparations containing active ingredients, skin care preparations, pharmaceutical formulas, etc., which can solve the problem of difficult absorption of mask nutrients, functional effects that need to be improved, and triggers Skin inflammation and other problems, to achieve the effect of good chemical sunscreen, good anti-ultraviolet ability, easy penetration and absorption

Inactive Publication Date: 2018-09-28
卜俊超
View PDF0 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, many facial masks that appear on the market today contain a large amount of chemical compounds. Long-term use will have certain side effects on the skin, making the nutrients in the facial mask difficult to be absorbed, and even cause adverse reactions such as skin inflammation. C

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] The technical solutions in the present invention are clearly and completely described below in conjunction with the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.

[0023] A preparation method for an after-sun repair mask containing Kudingcha extract, comprising the following steps:

[0024] Step 1: Put Kudingcha in an ethanol solution with a mass ratio of 1:40, after ultrasonic treatment, filter to obtain Kudingcha extract mother liquor, the ultrasonic power is 300-400w, and extract Kudingcha mother liquor In the middle press Kudingcha extract mother liquor: the mass of 75% ethanol solution is mixed at 1:23 to obtain the Kudingcha extract;

[0025] Step 2: Proportion of raw materials by weight: 2-4 parts of Kudingcha extract, 2-4 parts of propolis extract, 0.5-1 part of protease, 0.5-1 part of ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a preparing method of an after-sun repair mask containing broadleaf holly leaf extracts, and belongs to the technical field of mask preparing. The method includes the steps ofpreparing the broadleaf holly leaf extracts, proportioning raw materials according to weight parts, preparing water phase liquid, and conducting emulsifying, cooling and the like. The broadleaf hollyleaf extracts contain a large number of anti-ultraviolet active substances, are good in anti-ultraviolet capacity and have a quite good chemical sunscreen effect. Licorice root and chamomile have functions of clearing away heat and toxin, resisting bacteria and eliminating inflammation, and calming the nerves, are suitable for various types of skin and particularly suitable for sensitive skin, andcan be used for after-sun repairing of injured skin. By means of nanometer supercritical beewax quite easily permeating and absorbed, the problem of compatibility with other components is successfully solved, and the nanometer supercritical beewax has a strong oxidation resistance effect, a tyrosinase activity restraining effect and a remarkable whitening and freckle removing effect.

Description

technical field [0001] The invention relates to the technical field of facial mask preparation, in particular to a preparation method of an after-sun repairing facial mask containing Kudingcha extract. Background technique [0002] Mask is an important step in skin care. Effective ingredients such as moisturizing, whitening, and anti-aging in the mask can be better absorbed by the skin. However, many facial masks that appear on the market today contain a large amount of chemical compounds. Long-term use will have certain side effects on the skin, making the nutrients in the facial mask difficult to be absorbed, and even cause adverse reactions such as skin inflammation. It caused immeasurable losses. When making many facial masks on the market, there are big problems in the selection and dosage of chemical substances. There are few natural ingredients, and the skin care effect is not good. Further improvement is needed, and the functional effect needs to be improved. Conte...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): A61K8/98A61K8/9789A61K8/92A61K8/73A61K8/66A61K8/64A61K8/02A61Q17/04A61Q19/00A61Q19/02
CPCA61K8/988A61K8/0212A61K8/64A61K8/645A61K8/66A61K8/735A61K8/922A61K8/9789A61K2800/782A61K2800/82A61Q17/04A61Q19/00A61Q19/004A61Q19/005A61Q19/02
Inventor 卜俊超
Owner 卜俊超
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap