High-temperature-resistant frequency-adjustable flexible antenna and manufacturing method thereof
A flexible antenna and manufacturing method technology, applied to antennas, devices that make the antennas work in different frequency bands at the same time, radiating element structures, etc. and other problems, to achieve the effect of elasticity, good flexibility and excellent insulation performance
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Embodiment 1
[0069] Place a flexible mica sheet 10 with a thickness of 10 μm in a vacuum chamber and evacuate to 3×10 -3 Pa. Fill the vacuum chamber with Ar so that the vacuum degree is 0.1Pa, turn on the power supply of the heater, heat the flexible mica sheet 10 to 50°C, turn on the Plasma power supply, and adjust the voltage to 1000V, and the flexible mica sheet 10 is heated by the generated Ar plasma. Treat for 2min. Power off Plasma and evacuate to 3×10 -3 Pa, the flexible mica sheet 10 is heated to 300°C, and the vacuum chamber is filled with Ar and O 2 , the ratio of their flow values is 2:1, so that the vacuum degree is 0.1Pa, turn on the magnetron sputtering power supply, adjust the power to 80W, and form a dielectrically adjustable barium titanate material on the flexible mica sheet 10 magnetron sputtering deposition The deposition time of the ceramic thin film 20 is 10 minutes, and the thickness of the dielectric adjustable ceramic thin film 20 is 200 nm. Insulate in oxyge...
Embodiment 2
[0071] Place a flexible mica sheet 10 with a thickness of 50 μm in a vacuum chamber and evacuate to 3×10 -3 Pa. Fill the vacuum chamber with O 2 , so that the vacuum degree is 0.5Pa, turn on the power supply of the heater, heat the flexible mica sheet 10 to 150°C, turn on the Plasma power supply, adjust the voltage to 2000V, and treat the flexible mica sheet 10 for 20 minutes through the generated oxygen plasma. Power off Plasma and evacuate to 3×10 -3 Pa, the flexible mica sheet 10 is heated to 700°C, and the vacuum chamber is filled with Ar and O 2 , the ratio of their flow values is 5:1, so that the degree of vacuum is 0.5Pa, the magnetron sputtering power supply is turned on, and the power is adjusted to 150W, and the flexible mica sheet 10 magnetron sputtering deposits strontium barium titanate material to form a dielectric. Adjust the ceramic thin film 20, the deposition time is 2 hours, and the thickness is 2.4 μm. Insulate in oxygen for 60min, and take it out aft...
Embodiment 3
[0073] A flexible mica sheet 10 with a thickness of 10 μm is sandblasted so that the surface roughness is 100 nm, placed in a vacuum chamber, and evacuated to 3×10 -3 Pa. Fill the vacuum chamber with Ar so that the vacuum degree is 0.1Pa, turn on the power supply of the heater, heat the flexible mica sheet 10 to 50°C, turn on the Plasma power supply, and adjust the voltage to 1000V, and the flexible mica sheet 10 is heated by the generated Ar plasma. Treat for 2min. Turn off the Plasma power and pump the vacuum to 3×10 -3 Pa, the flexible mica sheet 10 is heated to 300°C, and the vacuum chamber is filled with Ar and O 2 , the ratio of their flow values is 2:1, so that the vacuum degree is 0.1Pa, turn on the magnetron sputtering power supply, adjust the power to 80W, and deposit the barium titanate material on the mica sheet to form a dielectrically adjustable ceramic film 20, the deposition time is 10min, and the thickness is 200nm. Incubate in oxygen for 20 min, then co...
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