Mask Restoration Equipment

A mask plate and equipment technology, which is applied in welding equipment, laser welding equipment, metal processing equipment, etc., can solve the problem of poor repair effect of the mask plate, and achieve the effect of improving the grinding effect

Active Publication Date: 2021-07-23
WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF8 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The embodiment of the present application provides a reticle repairing equipment to solve the technical problem that the existing reticle surface repairing equipment has a poor repairing effect on the reticle

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mask Restoration Equipment
  • Mask Restoration Equipment
  • Mask Restoration Equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Apparently, the described embodiments are only some of the embodiments of this application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application.

[0038] In the description of the present application, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Orientation indicated by rear, left, right, vertical, horizontal, top, bottom, inside, outside, clockwise, counterclockwise, etc. The positional relationship is based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The present application provides a reticle repairing device. The reticle repairing device includes a grinding mechanism. In the grinding mechanism, the first end of the guide head is connected to the second driving assembly, the second end abuts against the grinding belt, and the second The drive assembly is used to drive the guide head to swing to adjust the grinding angle of the grinding belt. In the present application, the grinding effect of the grinding mechanism is improved by setting the guide head of the grinding mechanism in a swingable manner.

Description

technical field [0001] The present application relates to the field of display technology, in particular to a reticle repairing device. Background technique [0002] In the surface repair equipment of the mask plate, when there are stubborn fibers and metal foreign objects, since the laser mechanism cannot remove them, it can only be manually ground, but the repair efficiency of manual grinding is low and it is not suitable for the uneven surface of the mask plate. The foreign matter grinding effect is poor, for example, the foreign matter on the concave surface cannot be ground. Contents of the invention [0003] An embodiment of the present application provides a reticle repairing device to solve the technical problem that the existing reticle surface repairing device has a poor repairing effect on the reticle. [0004] An embodiment of the present application provides a reticle repairing device, which includes: [0005] a grinding mechanism, the grinding mechanism is ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): B24B21/06B24B21/18B24B21/20B24B41/06B24B47/20B24B49/12B24B49/16G03F1/72B23K26/36B23K26/70
CPCB23K26/36B24B21/06B24B21/18B24B21/20B24B41/06B24B47/20B24B49/12B24B49/16B23K26/702G03F1/72
Inventor 陈策许亮
Owner WUHAN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap