Display panel and preparation method thereof

A display panel and substrate substrate technology, applied in photometry, semiconductor/solid-state device manufacturing, optical radiation measurement, etc., can solve the problems of inability to sense and transmit infrared light, unreasonable design of the film layer of the display device, and infrared sensitivity detection sensitivity Low-level problems, to achieve the effect of simple preparation process, increase the effective light absorption area, and improve detection sensitivity

Active Publication Date: 2021-02-26
WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The disclosed embodiments provide a display panel and a method for manufacturing the display panel, in order to solve the problems in the prior art that when the infrared sensitive display device is prepared, the internal structure of the display device and the design of each film layer are unreasonable, and the display device performs infrared detection. Infrared light cannot be sensed and transmitted accurately, the sensitivity of infrared photosensitive detection is low, and the preparation process is more complicated, and the production cost is higher.

Method used

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  • Display panel and preparation method thereof
  • Display panel and preparation method thereof
  • Display panel and preparation method thereof

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Embodiment Construction

[0040] The technical solutions in the embodiments of the disclosure will be clearly and completely described below in conjunction with the drawings in the embodiments of the disclosure. Apparently, the described embodiments are only some of the embodiments of the present disclosure, not all of them. Based on the embodiments in the present disclosure, all other embodiments obtained by those skilled in the art without creative efforts fall within the protection scope of the present disclosure.

[0041] In describing the present disclosure, it is to be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", " Orientation indicated by rear, left, right, vertical, horizontal, top, bottom, inside, outside, clockwise, counterclockwise, etc. The positional relationship is based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the present disclosure ...

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Abstract

The invention provides a display panel and a preparation method thereof. The display panel comprises a substrate and a thin film transistor device layer, wherein the thin film transistor device layercomprises an extension part, a fourth electrode layer and a first via hole, and the fourth electrode layer is connected with the extension part through the first via hole and forms a Schottky junctionstructure. The light receiving performance of each film layer in the display panel is effectively improved, the detection sensitivity of the infrared detection type display panel is improved, meanwhile, the preparation process of the display panel is simple, and the production cost is low.

Description

technical field [0001] The disclosure relates to the field of display panel display technologies, and in particular to a display panel and a method for manufacturing the display panel. Background technique [0002] With the continuous improvement of the display technology, the display technology of the liquid crystal display device is also developed accordingly, and the display device has been widely used in various electronic devices. [0003] Existing display panels not only need to have high resolution, wide viewing angle, and low power consumption, but also need to have other diversified functions, such as display panels that can perform human-computer interaction, infrared perception and detection, etc. Rich features and more. Currently, a display device with an infrared sensitive function has become one of the development directions. When preparing an infrared photosensitive functional display panel, polysilicon and amorphous silicon are usually used to prepare an ar...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/12H01L21/77G02F1/1333G02F1/1362G02F1/1368G01J1/44
CPCH01L27/1214H01L27/1259G02F1/136227G02F1/1368G02F1/1333G01J1/44G01J2001/4473
Inventor 艾飞龚帆宋继越宋德伟
Owner WUHAN CHINA STAR OPTOELECTRONICS TECH CO LTD
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