Vaporizer

Abstract

Provided is a vaporizer in which bumping is suppressed and the pressure fluctuation in a vaporization space is very small in a method that does not use a nebulizer. The vaporizer (1) consists of a container main body (10), a heated porous member (30) installed in the vaporizer (1), and an introduction pipe ( 40) and a gas discharge path (7) for discharging vaporized raw material gas (G) to the outside. The outlet (41) of the introduction pipe (40) is arranged in contact with or close to the porous member (30). When the outlet (41) is arranged close to the porous member (30), the separation distance (H) from the outlet (41) to the porous member (30) does not exceed the distance from the outlet (41) to the The surface tension becomes within the range of the size of the lower end of the liquid raw material (L) that becomes a droplet and hangs down from the outlet (41).

Description

technical field

[0001] The present invention relates to a gasifier that does not use a carrier gas for spraying for atomizing a liquid raw material before gasification, and more specifically, relates to a vaporizer that uses an introduction tube (capillary) that introduces a liquid raw material into the vaporizer by contacting or The gasifier is close to the porous member (sintered filter), and the pressure fluctuation during the gasification process is extremely small. Background technique

[0002] The manufacturing process of a semiconductor device includes a film forming process, an etching process, a diffusion process, and the like, and in these processes, gases are often used as raw materials. However, in recent years, liquid raw materials are often used instead of raw material gases.

[0003] This liquid raw material is converted into a gas by the vaporizer and supplied to the reaction process. In the case where the raw material is gas, since the flow rate is control...

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