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Vaporizer

A technology for a vaporizer and a container body, which is applied in the field of vaporizers and can solve problems such as large pressure fluctuations

Active Publication Date: 2021-03-30
LINTEC CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In such a gasification process that does not use spray gas or carrier gas, the pressure fluctuation is significantly larger than that in the case of using spray gas or carrier gas for the reasons described later.

Method used

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Embodiment Construction

[0048] Hereinafter, the present invention will be described with reference to the drawings. figure 1 It is a longitudinal sectional view of the vaporizer 1 of the present invention, and is composed of a container main body 10, a porous member 30, an introduction pipe 40, heaters 50a, 50b, and thermocouples 60a, 60b.

[0049] The container main body 10 is composed of an outer block 11 and an inner block 21 made of a corrosion-resistant material resistant to the liquid raw material L. As shown in FIG. The outer block 11 is formed with a storage hole 12 with an open lower surface, and an insertion hole 13 extending from the upper surface of the outer block 11 to the top surface of the storage hole 12 is formed therethrough. Moreover, one or more heaters 50 a are embedded in the side wall 14 of the outer block 11 surrounding the storage hole 12 to heat the outer block 11 to a set temperature. A thermocouple 60 a for measuring the temperature of the outer block 11 is attached to t...

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Abstract

Provided is a vaporizer which causes very little pressure fluctuation in a vaporization space by suppression of bumping when a method not using an atomizer is used. The vaporizer 1 comprises: a container body 10; a heated porous member 30 disposed inside the vaporizer 1; an introduction pipe 40 for supplying a liquid raw material L to the porous member 30; and a gas discharge path 7 for discharging a vaporized raw material gas G to the outside. An outlet 41 of the introduction pipe 40 is disposed in contact with or in close proximity to the porous member 30. When the outlet 41 is disposed in close proximity to the porous member 30, the clearance H from the outlet 41 to the porous member 30 is in a range not exceeding the distance from the outlet 41 to the bottom of a drop of the liquid rawmaterial L hanging from the outlet 41 due to surface tension.

Description

technical field [0001] The present invention relates to a gasifier that does not use a carrier gas for spraying for atomizing a liquid raw material before gasification, and more specifically, relates to a vaporizer that uses an introduction tube (capillary) that introduces a liquid raw material into the vaporizer by contacting or The gasifier is close to the porous member (sintered filter), and the pressure fluctuation during the gasification process is extremely small. Background technique [0002] The manufacturing process of a semiconductor device includes a film forming process, an etching process, a diffusion process, and the like, and in these processes, gases are often used as raw materials. However, in recent years, liquid raw materials are often used instead of raw material gases. [0003] This liquid raw material is converted into a gas by the vaporizer and supplied to the reaction process. In the case where the raw material is gas, since the flow rate is control...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/448B01J7/02H01L21/31
CPCC23C16/4485C23C16/4483B01B1/005B01B1/06B01J7/00B01J7/02B05B1/24
Inventor 小野弘文八木茂雄山本健太
Owner LINTEC CORP
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