Photomask used for color filter technology
A color filter and photomask technology, applied in the field of photomasks, can solve the problems of high repeatability, manufacturing cost, waste of labor, offset and the like
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[0039] The first embodiment of the present invention is as Figure 4 As shown, a photomask 30 for color filter process is disclosed. A reference symmetry axis 40 is set on the photomask 30. The symmetry axis can be an actual symmetry axis or a virtual reference symmetry axis 40; It has a center of symmetry 41 . The photomask 30 further includes a first alignment mark 31 and a second alignment mark 31', which are substantially symmetrical to each other with respect to the reference axis of symmetry 40 and the center of symmetry 41. In this embodiment, the first alignment mark 31 and the second alignment mark 31 are preferably substantially horizontally symmetrical with respect to the reference axis of symmetry 40 .
[0040] It should be noted that, the first alignment mark 31 and the second alignment mark 31' in this embodiment are not limited to horizontal symmetry, but can also be substantially obliquely symmetrical (not shown). Furthermore, as long as the first alignment m...
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