Composition for resist patterning and method of manufacturing optical structures using imprint lithography
a technology of resist patterning and imprint lithography, which is applied in the direction of photosensitive materials, instruments, photomechanical equipment, etc., can solve the problems of easy tunable optical properties of these materials, complicated technology and high cost of nano-imprinting, etc., and achieves improved transparency, high refractive index, and high efficiency.
Active Publication Date: 2016-04-21
ABEAM TECH
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Benefits of technology
The composition enables the fabrication of nanostructured films with refractive indices greater than 1.65 and high transparency (>90%) without the need for postannealing, suitable for roll-to-roll processes and high-resolution patterning of optical devices.
Problems solved by technology
However, such technology is much more complicated and expensive than nanoimprinting.
However, the applications of printable devices are still very limited because the currently available NIL inks have relatively low refractive indices (n<1.62).
Furthermore, the optical properties of these materials are easily tunable (G. Rizzo, et al, “Sol-gel glass from organic modified silicates for optics applications,”J.
Previous studies have demonstrated the patterning of sol-gel materials by thermal nanoimprinting, but they were limited by time-consuming and complex procedures (high pressure, temperatures, and plasma treatment) (see, e.g., C. Marzolin, et al., “Fabrication of glass microstructures by micro-molding of sol-gel precursors,”Adv. Mater. 10(8), 571 (1998); and S. H. Lim, et al, “Direct imprinting of high resolution TiO2 nanostructures,”Nanotechnology 21, 285303 (2010)].
However, the NIL ink used in the above work required a long postannealing step and the use of a high temperature; however, in view of the presence of a sol-gel composition, high temperatures are not suitable for nanoimprinting.
Method used
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[0027]An object of the invention is to provide a composition for a nanoimprint process and a method of nanoimprinting optical structures with use of the above-described composition. The composition and the method of the invention are based on the aforementioned second strategy of developing a resist material based on a high-refractive-index polymer matrix that may optionally be doped with an inorganic precursor (most of the time TiO2).
[0028]The main objective of the invention is to provide optical transparency and coefficient of refraction of the composition for nanoimprint processes which are superior to similar characteristics of the prior-art materials used for the same purpose.
[0029]The composition of the invention for use in nanoimprint and in other patterning processes imparts to nanopatterned structures novel features that make them superior to similar prior-art structures. In fact, the material of the invention is a resist, which comprises a polymeric matrix that incorporate...
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Abstract
Provided is a composition for resist patterning comprising a thiol; at least one -ene monomer; at least one polymerization initiator; and, optionally, a metal oxide used in an amount of 0.1 to 50 wt. % per weight of the composition; the thiol and -ene monomer are used in a stoichiometric ratio with a refractive index between 1.6 and 1.8. The composition is used in a patterning process wherein the composition is dispensed to the substrate, is covered with a mask, and is cured, e.g., by UV radiation, at room temperature with light having a wavelength in the range of 200 nm to 450 nm. The process may be carried out with thermal annealing.
Description
FIELD OF THE INVENTION[0001]The present invention relates to a composition for a nanoimprint process and to a method of nanoimprinting optical structures with the use of composition by patterning.BACKGROUND OF THE INVENTION[0002]Nanoimprint lithography (NIL) is a relatively new technology that finds use in the manufacture of planar micro- and nanodevices at low cost and with high productivity. Such effects result from the fact that in distinction from other known methods of generation and image transfer having nanodimensions, nanoimprint technology makes it possible to transfer a nanoimage as a whole and in one step instead of a multistage sequential transfer of image parts.[0003]A similar task of one-step pattern image transfer is achieved by using modern optical steppers of high resolution. However, such technology is much more complicated and expensive than nanoimprinting.[0004]Nanoimprinting consists of forming a pattern by means of a patterning lithography method, i.e., interfe...
Claims
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IPC IPC(8): G03F7/027G03F7/20
CPCG03F7/0275G03F7/027G03F7/2002G03F7/0002G03F7/0047G03F7/028C08L25/00
InventorHERNANDEZ, CARLOS PINAPEROZ, CHRISTOPHECABRINI, STEFANO
OwnerABEAM TECH