The invention relates to an integrated photoelectric
relay and a manufacturing method thereof. The manufacturing method of the integrated photoelectric
relay comprises the steps that a low-
doping substrate is used, a first P-N structure, a second P-N structure and an N-P-N structure are formed on an epitaxial layer, and the epitaxial layer is divided into a high-
voltage area and a low-
voltage area which are electrically isolated from each other through
dry etching. Next, an
isolation layer is deposited on the epitaxial layer,
mask etching is performed to generate a plurality of patterns, a
metal layer is deposited, a
light emitting diode is formed on the first P-N
structure based on the patterns, a
photodiode is formed on the second P-N structure, and at least one
metal oxide semiconductor field effect transistor is formed on the N-P-N structure. All elements of the integrated photoelectric
relay are manufactured on the same substrate by using the same manufacturing process, the withstand
voltage of the
alternating current switch can be greatly improved without additional elements, the
chip area is reduced, and meanwhile, the module cost is reduced.