Method for manufacturing laser devices
一种激光器件、激光器的技术,应用在激光器零部件、激光器、半导体激光器等方向,能够解决缩短寿命、工作电压升高、劣化驱动电流等问题,达到防止再次附着、防止驱动电流增大、长使用寿命的效果
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no. 1 example
[0066] (Structure of Nitride Semiconductor Laser Device)
[0067] Figure 1A and Figure 1B are a top view and a side view illustrating a schematic structure of a nitride semiconductor laser device according to the present invention, respectively. figure 2 A schematic structure of a laser chip mounting bracket constituting a nitride semiconductor laser device is shown.
[0068] like Figure 1B As shown, the nitride semiconductor laser device 101 includes a laser chip fixing bracket 100 and a tube case 106 covering and sealing the laser chip fixing bracket 100 . The laser chip fixing mount 100 includes a base 102 on which a nitride semiconductor laser chip 103 is mounted, and a stem 104 having a block portion 105 to which the base 102 is fixed. The stem 104 and its land portion 105 are integrally molded, and are composed of a metal such as copper or iron on which Au or the like is plated.
[0069] like Figure 1A As shown, the package 106 is equipped with a light transpare...
no. 2 example
[0112] Next, the manufacturing method according to the second example of the present invention will be described mainly around the differences from the manufacturing method in the above-mentioned first example. The steps up to the simultaneous die bonding and wire bonding of the nitride semiconductor laser chip 103, the submount 102, and the stem 104 are similar to those in the manufacturing method according to the first example. After completing the steps, the laser chip holder 100 and the package 106 are put into Figure 7 The ozone generator 290 is shown. Oxygen 295 under atmospheric pressure (having a purity of 99.9999% and a dew point of -10° C.) is introduced through the air inlet 291, and gradually sprayed out through the gas outlet 292. At this time, the ozone generator 290 is almost only filled with oxygen. The laser chip fixing bracket 100 and the tube shell 106 are heated to a predetermined temperature of 220° C., and the ultraviolet lamp 293 is heated at 5.1 mW / cm...
no. 3 example
[0117] Next, the manufacturing method according to the third example of the present invention will be described mainly around the differences from the manufacturing method in the above-mentioned first example. The steps up to the simultaneous die bonding and wire bonding of the nitride semiconductor laser chip 103, the submount 102, and the stem 104 are similar to those in the manufacturing method according to the first example. After completing the steps, the laser chip holder 100 and the package 106 are put into the Figure 8 Plasma generator 300 is shown, and argon and oxygen are introduced through gas inlet 311. The flow rate of argon was set to 100 seem and the flow rate of oxygen was set to 100 seem. The vacuum pump 313 connected to the gas outlet 312 reduces the pressure inside the plasma generator 300 to 10Pa.
[0118] Next, the temperature of the laser chip fixing bracket 100 and the package 106 is set to 220° C., and an oxygen plasma treatment is performed for 30 m...
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Abstract
Description
Claims
Application Information
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