Graytone mask blank, method of manufacturing graytone mask and graytone mask, and pattern transfer method
A technology of grayscale mask and manufacturing method, which is applied in the fields of grayscale mask blanks, grayscale mask manufacture, grayscale mask and pattern transfer, can solve problems such as rising costs, and achieve reduced changes and good transfer. The effect of the write feature
Active Publication Date: 2013-03-13
HOYA CORP
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Problems solved by technology
In the case where CD variation occurs beyond such a range, it is also possible to correct the CD error generated in the pattern by a defect correction method after forming a mask, but the correction step will cause further defects and costs as an additional step , so it is highly desirable to produce masks that do not require correction
Method used
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no. 1 approach
[0046] figure 2 is a cross-sectional view showing the manufacturing steps of the gray scale mask according to this embodiment. In this embodiment, a case of manufacturing a grayscale mask for TFT substrate manufacturing including a light-shielding portion, a light-transmitting portion, and a semi-transmitting portion will be described.
[0047] In the grayscale mask blank used in this embodiment, a semitransparent film 26 containing molybdenum silicide and a light shielding film 25 mainly composed of chromium, for example, are sequentially formed on a transparent substrate 24, and a resist is coated thereon. agent to form the resist film 27 (refer to figure 2 (a)). As a material of the light-shielding film 25, there exist Si, W, Al, etc. other than the above-mentioned material containing Cr as a main component, for example. In this embodiment, the transmittance of the light-shielding portion is determined by lamination of the above-mentioned light-shielding film 25 and th...
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Abstract
A graytone mask blank, a method for manufacturing graytone mask and graytone mask, a graytone mask and a pattern transfer method are provided to reduce CD change in the manufacture of the gray tone mask, and to obtain a graytone mask forming CD with high precision. A graytone mask blank is used in the manufacture of the gray tone mask forming the desired transfer pattern containing parts of different residue values by selectively reducing the dosage of the exposure light to the transferred body. The graytone mask blank has a semi-light-transparent film(26) and light shielding film(25) on the transparent substrate(24) and forms a light shielding portion(21), light-transparent portion(22) and semi-light-transparent portion(23).
Description
technical field [0001] The present invention relates to a pattern transfer method that uses a mask to form a transfer pattern with different resist film thicknesses on a photoresist on an object to be transferred, and a gray scale mask used in the pattern transfer method A manufacturing method thereof, and a grayscale mask blank used in the manufacture of the grayscale mask. Background technique [0002] Currently, in the field of liquid crystal display (Liquid Crystal Display: hereinafter referred to as LCD), thin film transistor liquid crystal display (Thin Film Transistor Liquid Crystal Display: hereinafter referred to as TFT-LCD) compared with CRT (cathode ray tube) due to It is easy to manufacture thin and low power consumption, so it is rapidly applied to modern products. TFT-LCD has a schematic structure in which a TFT substrate having a structure in which TFTs are arranged in each pixel arranged in a matrix and color filters in which red, green, and blue pixel patte...
Claims
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IPC IPC(8): G03F1/32G03F7/20G03F1/50G03F1/54G03F1/76
CPCG03F1/20G03F1/32G03F1/50G03F1/54G03F1/76H01L21/0276
Inventor 佐野道明井村和久三井胜
Owner HOYA CORP