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Two-end gas intake device for phosphorous diffusion furnace tube

A technology of air intake device and phosphorus diffusion, which is applied in the field of diffusion furnace, can solve the problems of poor uniformity of the resistance plate, and achieve the effect of improving the uniformity of square resistance

Active Publication Date: 2011-06-15
TRINA SOLAR CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Due to the diffusion of the POCl3 liquid source in the existing diffusion equipment, the gas flow N carrying the phosphorus source 2 , reaction gas O 2 Directly enter the furnace tube from the furnace tail through an inlet pipe, the gas concentration near the furnace mouth will be lower than the gas flow out of the furnace tail, resulting in poor uniformity between the square resistance plates of the whole tube

Method used

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  • Two-end gas intake device for phosphorous diffusion furnace tube
  • Two-end gas intake device for phosphorous diffusion furnace tube
  • Two-end gas intake device for phosphorous diffusion furnace tube

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Embodiment Construction

[0013] like figure 1 As shown, a kind of air inlet device at both ends of the phosphorus diffusion furnace tube includes two air inlet pipes 2 extending in the furnace pipe 1, the two ends of each air inlet pipe 2 are connected to the gas source, and the two ends of each air inlet pipe 2 The same kind of reaction gas is fed in, and the intake ratio at both ends of each intake pipe is adjusted through the valve. There are evenly distributed air outlet holes 3 on the air inlet pipe 2, and the outlet direction of the air outlet holes 3 is parallel to the surface of the silicon wafer 4. The root inlet pipe 2 is fed with different reaction gases respectively to prevent the gases from reacting in advance. The air outlet directions of the air outlet holes 3 on the two air inlet pipes 2 are perpendicular to each other. The extending directions of the two inlet pipes 2 are parallel to the axial direction of the furnace tube 1, and are respectively located in the direction of 15:30 and...

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Abstract

The invention relates to the technical field of diffusion furnaces, in particular to a two-end gas intake device for a phosphorous diffusion furnace tube. The two-end gas intake device comprises two gas intake tubes extending in a furnace tube, wherein both ends of each gas intake tube are connected with a gas source; the same reaction gas is introduced into both ends of each gas intake tube; the gas intake rates of both ends can be adjusted by a valve; O2 is introduced into one gas intake tube, and POCl3 is introduced into the other gas intake tube; vent holes are uniformly distributed on the gas intake tubes; the venting direction of each vent hole is parallel to the surface of a silicon wafer; and different reaction gases are respectively introduced into the two gas intake tubes. The invention achieves the aims of adjusting gas distribution in the tubes and improving square resistance uniformity by simultaneously introducing the reaction gases from a furnace opening and a furnace tail.

Description

technical field [0001] The invention relates to the technical field of diffusion furnaces, in particular to an air inlet device at both ends of a phosphorus diffusion furnace tube. Background technique [0002] Due to the diffusion of the POCl3 liquid source in the existing diffusion equipment, the gas flow N carrying the phosphorus source 2 , reaction gas O 2 Directly enter the furnace tube from the furnace tail through an inlet pipe, the concentration of gas near the furnace mouth will be lower than that of the gas outlet at the furnace tail, resulting in poor uniformity between the square resistance plates of the whole tube. Contents of the invention [0003] The technical problem to be solved by the invention is to improve the uniformity of square resistance inside and between slices after the phosphorus is diffused, so as to achieve better square resistance distribution of the whole tube. [0004] The technical scheme adopted by the present invention to solve the te...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B31/16
Inventor 方智
Owner TRINA SOLAR CO LTD
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