Chamomile facial mask

A technology of chamomile and chamomile essential oil, which is applied in the field of skin care products, can solve the problem that masks cannot meet the needs of skin care, and achieve the effects of repairing sensitive skin, soothing and improving skin quality.

Inactive Publication Date: 2013-03-06
DALIAN CHUANGDA TECH TRADE MARKET
View PDF0 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Masks have become a very important part of skin care. Masks are popular among women because of their rich nutrition and obvious effects. Masks are mainly used for whitening and hydrating. However, due to the improvement of quality of life, many women have various skin problems and have a single function. Masks can no longer meet the needs of skin care

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0014] A kind of chamomile facial mask is made up of moisturizing agent, thickener, nutrient and water; Its component mass percent is:

[0015] Moisturizer 13%

[0016] Nutrients 18%

[0017] Thickener 0.3%

[0018] The remainder is water;

[0019] Wherein, the moisturizing agent is hyaluronic acid, the thickening agent is xanthan gum or carbomer, and the nutritional agent is a mixture of Moroccan chamomile essential oil, lavender essence and vitamin E, and the ratio is 5:3:2.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention belongs to the field of skin care products, and particularly relates to a chamomile facial mask, which consists of a moistening agent, a thickening agent, a nutritional agent and water, wherein the moistening agent is hyaluronic acid; the thickening agent is xanthan gum or carbomer; and the nutritional agent is a mixture of ormenis multicaulis essential oil, lavender essence and vitamin E in a proportion of 5:3:2. A flavonoid active ingredient included in the chamomile has excellent effects of relieving allergy, repairing sensitive skin, reducing fine red blood silk, reducing redness, adjusting uneven skin tone and the like, and can be further used for improving acne, allergy and eczema; and thus, the facial mask not only has whitening and moistening effects but also can be used for improving and repairing the skin.

Description

technical field [0001] The invention belongs to the field of skin care products, and in particular relates to a chamomile facial mask. Background technique [0002] Masks have become a very important part of skin care. Masks are popular among women because of their rich nutrition and obvious effects. Masks are mainly used for whitening and hydrating. However, due to the improvement of quality of life, many women have various skin problems and have a single function. The facial mask has been unable to meet the needs of skin care. [0003] Chamomile has been regarded as the "sacred flower" since ancient times. It is rich in flavonoid active ingredients, which have anti-oxidation, anti-angiogenic, anti-inflammatory, anti-allergic and anti-viral effects. Contents of the invention [0004] In order to solve the above problems and improve women's skin quality, the invention provides a chamomile facial mask. [0005] A kind of chamomile facial mask is made up of mois...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/97A61Q19/00A61Q19/02A61P17/10A61P17/00
Inventor 不公告发明人
Owner DALIAN CHUANGDA TECH TRADE MARKET
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products