Phase mask plate optimal parameter acquisition method applied to wavefront coding system
A phase mask and optimal parameter technology, applied in the field of optics, can solve the problems of signal-to-noise ratio loss, image restoration quality degradation, and difficulties in intermediate blurred images
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[0044]The present invention proposes a method for obtaining the optimal parameters of the phase mask applied to the wavefront encoding system. This method incorporates the insensitivity of the phase transfer function PTF to defocus into the target evaluation function, as shown in formula (4) Show. The traditional optimization process based only on the out-of-focus optical transfer function OTF is expressed by formula (5).
[0045] min ( [ a · m 2 + b · n 2 + c · l 2 ] )
[0046] Subject to∫MTF(u,W 20 =0)du≥Th
[0047]
[0048] min ( ∫ ...
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