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Mask plate and composition process system and method

A patterning process and mask technology, which is applied in the field of mask and patterning process system, can solve the problems of producers and users who are troubled by the economy, the mask cannot be used, and the mask is expensive, so as to save the design work, energy saving, cost saving effect

Inactive Publication Date: 2015-12-23
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Because the price of the mask is very expensive, if there is any error in the process of mask design, production, transportation, storage or replacement, the mask will not be usable, which brings serious problems to designers, producers and users. great distress and economic loss

Method used

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  • Mask plate and composition process system and method
  • Mask plate and composition process system and method
  • Mask plate and composition process system and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] figure 1 A schematic structural view of the mask plate provided by Embodiment 1 of the present invention is shown, as shown in figure 1 As shown, the mask plate provided by Embodiment 1 of the present invention includes: a control unit 10 and a liquid crystal cell 20;

[0044] The control unit 10 is configured to control the liquid crystal cell 20 to present a preset mask pattern according to a control instruction;

[0045] The control instruction is a control instruction determined according to the preset mask pattern.

[0046] The mask plate described in this embodiment includes a control unit and a liquid crystal cell, the control unit controls the liquid crystal cell to present a preset mask pattern according to a control instruction, and the control instruction is based on the preset mask pattern Definite control instructions. The mask plate described in this embodiment can present different mask patterns according to needs, so this embodiment realizes the funct...

Embodiment 2

[0048] Embodiment 2 of the present invention also provides a mask plate, which has new features in addition to the same features as the mask plate described in Embodiment 1 above.

[0049] In this embodiment, the mask plate is provided with a plurality of mask sub-areas arranged in rows and columns, and each mask sub-area is provided with a corresponding control switch; the control switch is used to control the corresponding The light-transmitting state of the liquid crystal in the mask sub-region makes the liquid crystal cell present the preset mask pattern. Wherein, the light-transmitting state includes full light-transmitting, opaque and gray-scale light-transmitting.

[0050]For the preset mask pattern, it generally includes a region that needs to be fully exposed, a region that is not exposed at all and a partially exposed region. For the fully exposed area, the light-transmitting state of the liquid crystal in the corresponding mask sub-region is fully light-transmittin...

Embodiment 3

[0053] Embodiment 3 of the present invention provides a mask, which has new features in addition to the same features as the mask described in Embodiment 2 above.

[0054] In this embodiment, the control switch may be implemented by using a thin film transistor. Specifically, the thin film transistor controls the light transmission state of the liquid crystal in the corresponding mask sub-region to be fully transparent, opaque or grayscale transparent according to the control instruction. see figure 2 , figure 2 is a schematic cross-sectional structure diagram of the liquid crystal cell 20, from figure 2 It can be seen from the figure that the liquid crystal cell 20 includes a plurality of mask sub-regions (m rows and n columns) arranged in rows and columns, and each mask sub-region is provided with a corresponding control switch, that is, a thin film transistor. The control unit 10 controls each thin film transistor so as to realize the partition control of the liquid c...

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Abstract

The invention provides a mask plate and a composition process system and method. The mask plate comprises a control unit and a liquid crystal box. The control unit is used for controlling the liquid crystal box to display a preset mask pattern according to a control command; the control command is determined through the preset mask pattern. The mask plate can display different mask patterns according to needs, therefore, by means of the mask plate, the function that one mask plate corresponds to the products needing different mask patterns is achieved, and on one hand, the work for designing different mask plates is omitted; on the other hand, due to the fact that multiple mask plates are not needed, the cost of the mask plates is reduced; most importantly, when the types of the products with different patterns need to be changed, ultraviolet irradiation can be conducted without replacing the mask plates, the mask plate does not need to be disassembled within the range of normal service life, the technological operation is easy, and the energy consumption is saved.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a mask plate, a patterning process system and a method. Background technique [0002] As a tool for transferring fine patterns, the mask plate is used for mass replication of the mask manufacturing process. It plays a crucial role in the production of the substrate, especially when the sealant is cured, it must be carried out under the protection of the mask plate. , otherwise poor display performance will occur, so using a mask to cure the frame sealant is an indispensable link in the display equipment industry chain. Moreover, in the substrate production process, different products correspond to different graphics, so different masks are required to correspond. In this way, different masks need to be designed and produced for different products, and frequent changes are also required in actual applications. Change different mask plates to realize the production of different p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1339G02F1/133
CPCG02F1/13306G02F1/1339G02F1/1334G03F7/2057
Inventor 马国靖徐长健王丹任锦宇
Owner BOE TECH GRP CO LTD
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