Developing apparatus and developing method

A technology of developing equipment and developing solution, which is applied in the processing of photosensitive materials, etc., can solve the problems of poor uniformity of line width of patterns and graphics, and achieve the effects of small size, light weight and low power consumption

Inactive Publication Date: 2016-05-25
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0005] The purpose of the present invention is to provide a developing device and a developing method, so as to improve the problem that the pattern line width uniformity of the pattern formed after the substrate is developed is poor when the current developing device is used for developing the substrate

Method used

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  • Developing apparatus and developing method
  • Developing apparatus and developing method

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Embodiment Construction

[0041] The implementation process of the embodiment of the present invention will be described in detail below in conjunction with the accompanying drawings. It should be noted that the same or similar reference numerals represent the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary only for explaining the present invention and should not be construed as limiting the present invention.

[0042] see figure 2 , the embodiment of the present invention provides a developing device, including a carrying platform 1 and a plurality of nozzles 2, the carrying platform 1 is used to carry a substrate 3 and make the first extension direction AB of the substrate 3 form a predetermined angle θ with the horizontal plane, and each nozzle 2 Arranged side by side above the carrying platform 1 and at the same height from the horizontal plane, the arrangement direction of each nozzle ...

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Abstract

The invention discloses a developing apparatus and a developing method for improving the situation of poor uniformity of the line width of a pattern formed after development of a substrate when the current developing apparatus is used for performing the developing process to the substrate. The developing apparatus comprises a bearing platform and a plurality of nozzles, wherein the bearing platform is used for bearing the substrate and enabling the first extension direction of the substrate to form a preset included angle with the horizontal plane; all nozzles are arranged above the bearing platforms side by side and are away the same distance from the horizontal plane, the vertical projections of the arrangement direction of each nozzle and the first extension direction on the horizontal plane are parallel, the nozzle is used for spraying developing liquid onto the substrate in a solid cone manner, and the divergence angle of each nozzle for spraying developing liquid is adjustable so that the developing liquid sprayed by two adjacent nozzles falls onto the overlapped area of the substrate.

Description

technical field [0001] The invention relates to the field of liquid crystal display, in particular to a developing device and a developing method. Background technique [0002] As we all know, liquid crystal displays have many advantages that other displays cannot match, such as low power consumption, small size, light weight, and ultra-thin screen. In recent years, they have been widely used in smart instruments, meters and low-power electronic products controlled by single-chip computers. [0003] Such as figure 1 As shown, when the current developing equipment develops the substrate of the liquid crystal display, it includes the following process: the substrate 3 is placed on the carrying platform 1, and the carrying platform 1 drives the substrate 3 to form a preset inclination angle with the horizontal plane. A plurality of nozzles 2 spray the developing solution on the substrate 3 , and then develop the substrate 3 . [0004] Such as figure 1 As shown, when the curr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/30
CPCG03F7/30
Inventor 郭杨辰
Owner BOE TECH GRP CO LTD
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