Nondestructive measuring method for sidewall angle of micro-nano medium waveguide or stepped structure by using confocal laser scanning microscopic system

A technology of laser scanning and microscopic systems, which is applied in the field of precision processing and precise measurement of micro-nano-scale optical dielectric devices and structures, can solve the problems of inability to obtain side wall angle measurement values, and achieve easy handling and placement, small size, Simple operation effect

Active Publication Date: 2019-06-14
CHANGCHUN UNIV OF SCI & TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, it fails to obtain usable sidewall angle measurements for determining sidewall irregularities, such as those with sidewall angles close to 90° and greater than 90° (known as cliff and undercut cliffs, respectively)

Method used

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  • Nondestructive measuring method for sidewall angle of micro-nano medium waveguide or stepped structure by using confocal laser scanning microscopic system
  • Nondestructive measuring method for sidewall angle of micro-nano medium waveguide or stepped structure by using confocal laser scanning microscopic system
  • Nondestructive measuring method for sidewall angle of micro-nano medium waveguide or stepped structure by using confocal laser scanning microscopic system

Examples

Experimental program
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Effect test

Embodiment 1

[0052] Example 1: For such as Figure 7 For the reconstructed scanning pattern shown in A, select different positions on the same waveguide channel to make a cut section and calculate the value of the side wall angle 21, and then calculate the average value φ for all selected positions ave and standard fluctuations. then use Figure 6 Given that the inherent measurement error has a significant effect on the obtained as Figure 7 The average value shown in B is compensated to obtain the final value. From Figure 5 B, it can be seen that the average value φ of the left and right side wall angles ave are 84.90° and 84.83° respectively, by Figure 4 The given measurement error corresponds to the two angle values ​​being -1.93° and -1.97° respectively, so that the left and right side wall angles of the measured waveguide structure are: 84.90°-(-1.93°)=86.83° and 84.83°- (-1.97°) = 86.80°.

Embodiment 2

[0053] Example 2: For the reconstructed scanned graphics, such as Figure 8 As shown in A, select multiple waveguide channels, select a position to make a cut section, and calculate the value of the side wall angle 21, and then calculate the average value φ for all waveguide channels or structures ave and standard fluctuations. then use Figure 4 Given that the inherent measurement error has a significant effect on the obtained as Figure 8 The average value φ shown in B ave Compensation is performed to obtain the final value. From Figure 8 B, it can be seen that the average value φ of the left and right side wall angles ave are 85.00° and 84.90° respectively, by Figure 6 The given measurement error corresponds to the two angle values ​​being -1.90° and -1.93° respectively, so that the left and right side wall angles of the waveguide structure measured are: 85.00°-(-1.90°)=86.90° and 84.90°- (-1.93°) = 86.83°.

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Abstract

The invention relates to a method for rapidly and nondestructively detecting a micro-nano medium waveguide or a stepped structure by using a confocal laser scanning microscopic system, and relates tothe field of precision machining and test. The method comprises the following steps: designing a confocal laser scanning microscopic system, and arranging an adjustable pinhole diaphragm in front of adetector; designing a laser scanner with a scanning range reaching 100 micrometers and control accuracy reaching 10nm and a carrier table with adjustable object distance and dip angle, and selectinga 405nm wavelength laser; placing a detected substrate onto the carrier table, and setting a diaphragm pinhole as a certain value less than 1.0 airy unit, selecting a scanning range and a scanning layer thickness, then scanning, and storing data; reconstructing a scanning diagram, and testing a sidewall angle of the waveguide by crossing a waveguide channel; and calculating an average value and root-mean-square difference of the sidewall angles of multiple channels, forming a plurality of sections along the waveguide channel, and then calculating an average value and root-mean-square difference of sidewall angles of all cut surfaces on each waveguide channel. The method can be applied to the nondestructive online rapid detection of a large-scale micro-nano structure.

Description

technical field [0001] The invention relates to the field of precision processing and precise measurement of micro-nano-level optical dielectric devices and structures, and in particular to a non-destructive measurement method for side wall angles of micro-nano-level dielectric waveguides or stepped structures by using a confocal laser scanning microscope system. Background technique [0002] As the most mature planar lightwave circuit (PLC) technology at present, devices based on silicon oxide waveguides have covered active and passive devices in the field of optoelectronic information. Especially in the past ten years, the research and wide application of silicon-based waveguide photonics devices has formed a new field of silicon-based integrated photonics, in which dielectric materials account for the main part, and play the role of transmission medium for optical signals. For electronic signals, it plays the role of isolation and insulation between signals. In recent ye...

Claims

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Application Information

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IPC IPC(8): G01N21/64G01N21/84G01N21/01
Inventor孙德贵尚鸿鹏
OwnerCHANGCHUN UNIV OF SCI & TECH