Check patentability & draft patents in minutes with Patsnap Eureka AI!

Polishing solution recovery device and method using double vacuum pump bodies

A technology for recycling device and polishing liquid, applied in the field of polishing liquid recycling device with double vacuum pump body, can solve the problems of insufficient vacuum strength, affecting the effect of magnetorheological processing elements, etc., and achieve the effect of efficient recycling and improving stable working state

Active Publication Date: 2021-08-10
LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
View PDF19 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the vacuum strength is not enough, resulting in the adsorption of residual polishing fluid on the polishing wheel, which affects the effect of magnetorheological processing components

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polishing solution recovery device and method using double vacuum pump bodies
  • Polishing solution recovery device and method using double vacuum pump bodies
  • Polishing solution recovery device and method using double vacuum pump bodies

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] The following description provides a number of different embodiments, or examples to implement different features of the present invention. The elements and arrangements described in the following specific examples are intended to be intended to be illustrative, and is not intended to limit the invention.

[0032] See figure 1 , The example of the present invention discloses a double vacuum pump polishing liquid recovery device including a vacuum cavity 1, a first vacuum pump body 2, a second vacuum pump body 3, and a polishing liquid storage device 4;

[0033] The vacuum cavity includes an input interface 11, a first vacuum interface 12, a second vacuum interface 13;

[0034] The polishing liquid enters the vacuum cavity 1 through the input interface 11, and the first vacuum pump body 2 communicates with the vacuum cavity 1 through the first vacuum interface 12, the second vacuum pump body 3 through which The second vacuum interface 13 communicates with the vacuum cavity 1...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention is suitable for the technical field of optical element machining, and provides a polishing solution recovery device using double vacuum pump bodies. The device comprises a vacuum cavity, the first vacuum pump body, the second vacuum pump body and a polishing solution storage device; the vacuum cavity comprises an input interface, a first vacuum interface and a second vacuum interface; and a polishing solution enters the vacuum cavity through the input interface, the first vacuum pump body communicates with the vacuum cavity through the first vacuum interface, the second vacuum pump body communicates with the vacuum cavity through the second vacuum interface, and the polishing solution storage device communicates with the first vacuum pump body. The device can realize residue-free efficient recovery of the polishing solution, and the stable working state of the polishing solution is improved.

Description

Technical field [0001] The present invention relates to the field of optical element processing, in particular, to a double vacuum pump body polishing liquid recovery apparatus and method. Background technique [0002] Magnetorial polishing technology is a high-precision optical element precision processing technology. It is used to adsorb magnetic polishing fluid in the inside of the polishing wheel, and the magnetic polishing fluid and component processing surface generate relative movement by rotation of the polishing wheel. The processing of the surface of the element is achieved by shearing removal. [0003] Magnetic polishing fluid is cycled, which is mainly circulated by the liquid supply system and the recovery device of the polishing fluid, such as Figure 4 Indicated. The magnetic polishing liquid has two features, one is the magnetic polishing liquid from the iron powder having a mass ratio of more than 80%, so the liquid specific gravity is large, and the vacuum pump b...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B24B57/02B24B57/00B24B1/00B24B29/02
CPCB24B57/02B24B57/00B24B1/005B24B29/02Y02P70/10
Inventor 侯晶刘世伟许乔陈贤华张清华蒙晨郑楠李海波王健刘民才
Owner LASER FUSION RES CENT CHINA ACAD OF ENG PHYSICS
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More