Monocrystalline silicon wafer texturing equipment
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 徐州中辉光伏科技有限公司
- Publication Date
- 2022-07-01
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Abstract
Description
technical field
[0001] The invention relates to the field of silicon wafer texturing equipment, and more particularly, to a single crystal silicon wafer texturing equipment. Background technique
[0002] The main production processes of crystalline silicon solar cells are usually: texturing, diffusion, wet etching, PECVD deposition, screen printing and sintering. Texturing is the first process of solar cell production, and its main purposes are:
[0003] 1. Remove the mechanical damage layer on the surface of the silicon wafer;
[0004] 2. Remove oil and metal impurities on the surface of silicon wafers;
[0005] 3. Form an undulating suede surface, increase the light-absorbing area, reduce the reflectivity of light, increase the short-circuit current (Isc), and finally improve the photoelectric conversion efficiency of the battery.
[0006] Texturing is mainly processed by HNO3, HF texturing, washing, KOH corrosion, washing, HF, HCl cleaning, etc. The texturing equipment ...