Special-purpose cultivation matrix for spring cuckoo and its preparation method

A technology for cultivating substrate and spring cuckoo, which is applied in the field of plant cultivation substrate and preparation, can solve the problems of increasing production cost of Rhododendron, strong permeability and high price, and achieves the effects of simple and reliable preparation method, convenient use and low production cost.
CN1733661AActive Publication Date: 2006-02-15潘菊明

Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
潘菊明
Publication Date
2006-02-15
Patent Text Reader

Abstract

The preparation method for special cultivating ground substance for Sims Azalea comprises, mixing 40-50% scorched earth, 15-28% pearlite, 15-28% fermented mushroom mud, and 6-15% yellow sand; adjusting the pH value to 5.5-6.5; holding relative humidity in 55-65%; adding chloroquine of 600 times, adjusting pH value to 6 with relative humidity in 60%; and preparing into the product. Compared with existing technique, this method is simple and safe, needs low cost, and has better performance fit to product in scale for Sims Azalea.
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Description

technical field

[0001] The invention relates to a plant cultivation substrate and a preparation method, in particular to a spring azalea cultivation substrate and a preparation method. Background technique

[0002] Rhododendron is a kind of greening seedling, which belongs to shrub plant. It can be carried in pots or in soil. After long-term cultivation, many varieties have been formed, one of which is Spring Rhododendron. Rhododendron likes acidic soil, and its cultivation base is mostly made of a mixture of mountain mud, peat, and yellow sand; and mountain mud, good quality is bound to be expensive, which increases the production cost of Rhododendron. However, other cultivation basic materials currently used have strong permeability but poor water retention, and the air-to-water ratio and basal fertilizer cannot always reach a good ratio. Contents of the invention

[0003] The purpose of the present invention is to provide a special cultivation substrate for spring azal...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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