Developing apparatus
a technology of developing apparatus and development chamber, which is applied in the direction of photomechanical equipment, instruments, originals for photomechanical treatment, etc., can solve the problems of increasing the consumption of developer, difficulty in causing the developer to impinge in the desired position or range on the substrate, and inconvenience that the developer cannot be supplied withou
Inactive Publication Date: 2009-04-23
SOKUDO CO LTD
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Benefits of technology
"The invention is a developing apparatus for a substrate that can check the consumption of developer. It includes a spin holder for holding the substrate, a developer feeder with multiple exhaust ports for discharging developer, and a moving mechanism for moving the developer feeder in a radial direction over the substrate. The controller controls the spin holder and moving mechanism to cause the developer to impinge in a spiral pattern on the substrate. This results in efficient supply of developer to the substrate, reducing consumption. The invention also includes a controller that can control the movement of the developer feeder to cause the separate streams of developer to impinge on the substrate in a specific pattern, covering the entire substrate without gaps."
Problems solved by technology
In such a case, it becomes difficult to cause the developer to impinge in desired positions or ranges on the substrate.
Even though the developer is supplied spirally, there arises an inconvenience that the developer cannot be supplied without gaps over the entire surface of the substrate.
In this case, consumption of the developer is increased.
Method used
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Embodiment Construction
[0042]One embodiment of this invention will be described in detail hereinafter with reference to the drawings.
[0043]FIG. 1 is a block diagram showing an outline of a developing apparatus according to this invention. FIG. 2 is a plan view of the developing apparatus.
[0044]The developing apparatus in this embodiment includes a spin chuck 1 for supporting a wafer W in horizontal posture by sucking a central part of the lower surface thereof. The spin chuck 1 has a forward end of an output shaft 3a of a motor 3 connected to a lower central position thereof. The motor 3 rotates the output shaft 3a to spin the spin chuck 1 and wafer W about a vertical axis AX. The vertical axis AX extends substantially through the center of the wafer W. The spin chuck 1 and motor 3 correspond to the spin holder in this embodiment. However, the spin holder is not limited to the above example. For example, the spin chuck 1 may be replaced with a spin disk having a plurality of pins for holding edges of wafe...
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A developing apparatus disclosed includes a spin chuck for spinnably holding a substrate, a developer nozzle having a plurality of exhaust ports arranged in a row for discharging a developer, the developer nozzle causing the developer discharged from the exhaust ports to impinge in separate streams on the substrate, a horizontal movement mechanism for moving the developer nozzle in one direction extending to the center of the substrate in plan view while maintaining a direction of arrangement of the exhaust ports in the one direction, thereby to move the developer nozzle between substantially the center and an edge of the substrate in plan view, and a controller for controlling the spin chuck and horizontal movement mechanism to cause the separate streams of the developer discharged from the exhaust ports to impinge spirally on the substrate, thereby to develop the substrate.
Description
CROSS-REFERENCES TO RELATED APPLICATIONS[0001]This application claims priority to Japanese Patent Application 2007-271366, filed Oct. 18, 2007. The disclosure of JP 2007-271366 is hereby incorporated by reference its entirety for all purposes.BACKGROUND OF THE INVENTION[0002]This invention relates to a developing apparatus for developing semiconductor wafers, glass substrates for liquid crystal displays, glass substrates for photomasks, and substrates for optical disks (hereinafter called simply “substrates”). More particularly, the invention relates to a technique for checking consumption of a developer by supplying the developer to substrates efficiently.[0003]Conventionally, this type of apparatus includes a spin chuck for rotatably supporting a substrate, a slit nozzle for supplying a developer in a belt-like shape to the substrate, and a moving mechanism for moving the slit nozzle. This apparatus supplies the developer in the belt-like shape spirally to the substrate while spin...
Claims
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IPC IPC(8): G03G15/00
CPCG03F7/3021G03F7/2041G03F1/60G03F7/162H01L21/0274H01L21/6715B05D1/005G03F7/30
Inventor HARUMOTO, MASAHIKOYAMAGUCHI, AKIRAHISAI, AKIHIROSUGIYAMA, MINORUKURODA, TAKUYA
Owner SOKUDO CO LTD