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Exposure apparatus

A technology of exposure device and exposure amount, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, optics, etc., can solve the problems of increasing space, not being able to set various shapes of light-shielding components, and increasing costs, so as to achieve the purpose of suppressing exposure The effect of quantitative deviation

Inactive Publication Date: 2011-03-02
NSK TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the types and numbers of panels cut out from one glass substrate are different, it is not possible to provide light-shielding members of various shapes corresponding to them, and there are problems such as increased cost and increased space.

Method used

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  • Exposure apparatus
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Embodiment Construction

[0077] Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. figure 1 is a plan view of the exposure apparatus of this embodiment, figure 2 It is a side view showing the state at the time of exposure by the exposure apparatus of this embodiment. In addition, in the following embodiments, it is assumed that the horizontal plane is defined in the X-axis direction and the Y-axis direction, and the vertical direction is defined in the Z-axis direction.

[0078] figure 1 Among them, on the susceptor 1, a large sheet-shaped substrate W is held by a substrate chuck (substrate drive unit) 2, and can move from left to right together with the substrate chuck 2 along a rail 2a. On the susceptor 1, seven are arranged on the left side (upstream side) and six are arranged on the right side (downstream side) across the mask conveyance line (also called mask conveyance path) L (13 in total). The holding device 10 holding the mask M i...

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Abstract

Provided is an exposure apparatus by which light is suitably blocked for a non-exposure region, at the time of performing pattern exposure by relatively moving a substrate and a mask. While an exposure region is being exposed, a blind member (20) is shifted to the upstream by having the blind member pass over light (EL) used for exposure. Thus, irrespective of the number of exposure regions, exposure of the non-exposure region can be eliminated by using the one blind member (20).

Description

technical field [0001] The present invention relates to an exposure device, for example, an exposure device suitable for exposing a mask pattern on a copy mask on a substrate of a large flat panel display such as a liquid crystal display or a plasma display. Background technique [0002] Large flat-panel displays such as liquid crystal displays and plasma displays used in large flat-screen TVs are manufactured by proximately exposing a pattern of a transfer mask on a substrate by a split sequential exposure method. As a conventional split sequential exposure apparatus of this type, for example, it is well known to use a mask smaller than a substrate as a material to be exposed, hold the mask by a mask table, and hold the substrate by a work table, and place the two in close proximity to each other. In this state, the work stage is moved step by step relative to the mask, and the substrate is irradiated with light for pattern exposure from the mask side at each step, and a pl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20H01L21/027
CPCG03F7/70216
Inventor 佐治伸仁
Owner NSK TECH