Control device and control method for equipment

Abstract

The invention provides a control device and a control method for equipment. The device specifically comprises a secondary controller and a main controller. The secondary controller is connected with controlled equipment and comprises a service establishing module, a service execution module and a service state modifying module, wherein the service establishing module is used for establishing control service, the control service is used for achieving the movement function of the controlled equipment and comprises an inlet and an outlet which are arranged in an internal storage area of the secondary controller; the service execution module is used for executing control service corresponding to the inlet when the inlet is activated; and the service state modifying module is used for modifying the state of the corresponding control service by operating the corresponding outlet in the internal storage area of the secondary controller after the control service is executed. The main controller is connected with the secondary controller and comprises a service activation module and a service monitoring module, wherein the service activation module is used for activating the inlet of the control service by operating the internal storage area of the secondary controller, and the service monitoring module is used for monitoring the state of the control service according to the outlet of the control service. The control device and the control method can flexibly control the controlled equipment.

Description

technical field [0001] The present invention relates to the technical field of equipment control, in particular to an equipment control device and method. Background technique [0002] The manufacture of semiconductor devices is inseparable from plasma, so the enhanced plasma chemical vapor deposition (PECVD, Plasma-enhanced chemical vapor deposition) device that generates plasma is a key component in the production process of semiconductor devices. [0003] For example, refer to figure 1 , shows a PECVD device in the production process of crystalline silicon solar cells, which adopts an inline structure, and may specifically include the following equipment: a loading station, a preheating chamber, a process chamber, a cooling chamber, and an unloading station; These devices are controlled to ensure the normal progress of the crystalline silicon solar cell production process. [0004] In the existing method, both the loading platform and the unloading platform are controll...

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Problems solved by technology

[0007] 1. In the existing method, each control function of the PECVD main control system needs to be realized through the corresponding DIO signal, and each group of DIO signals needs to be connected separately, and the addition of control functions will be limited by the number of PLC terminals ; Therefore, in the existing method, the PECVD main control system can only realize limited control functions through a limited number of DIO signals, such as controlling the carrier plate to be transmitted to the loading platform, starting the loading operation, etc., thereby causing the PECVD main control system to be unable to load Complete control of the platform and unloading platform, that is, the control is not flexible enough, for example, the main system of PEVCD cannot obtain the operation status of the carrier board, the operation status of the gantry, etc.;

[0008] 2. The PECVD main control system usually uses the touch screen terminal 2 as the operation interface. For the user, it is necessary to configure between the touch screen 1 and the touch screen 2 during the production process of crystalline silicon solar cells, which brings inconvenience to the use

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