Matrix type sapphire substrate and preparation method thereof

A sapphire substrate and matrix technology, applied in the field of sapphire, can solve the problems of increased production cost, inability to recycle, waste of resources, etc., and achieve the effects of improving chip heat dissipation, saving costs, and reducing damage to the backside

Inactive Publication Date: 2012-07-25
WUXI LUX MATERIAL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

If the laser generated by this technology is to ensure a uniform energy density distribution, the maximum area that can be achieved is 5 × 5 mm, and it is still impossible to perform large-area laser peeling
Small pieces of sapphire material

Method used

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  • Matrix type sapphire substrate and preparation method thereof
  • Matrix type sapphire substrate and preparation method thereof

Examples

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Example Embodiment

[0054] See figure 1 , The present invention relates to a matrix sapphire substrate, comprising a substrate body 1, the material of the substrate body 1 is a sapphire cutting sheet, grinding sheet or polishing sheet, the thickness of the substrate body 1 is 200um~ The surface of the substrate body 1 is provided with grooves 2 arranged in a crisscross pattern. The depth of the grooves 2 is 1 nm to 500 um, and the width d of the grooves 2 is 0.1 nm to 5.0 mm. The staggered grooves 2 divide the surface of the substrate body 1 into a matrix pattern, the distance a between the longitudinal grooves 2 is 1mm-50mm, and the distance b between the transverse grooves 2 is 1mm-50mm, the substrate body 1 can have any shape. As a preference, the shape of the substrate body 1 is circular, and the diameter of the circular substrate body 1 is 25-300 mm. As a preference, the substrate body 1 The shape of is a square, and the side length of the square substrate body 1 is 25-300 mm.

[0055] The pr...

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Abstract

The invention relates to a matrix type sapphire substrate which comprises a substrate body (1) and is characterized in that: the surface of the substrate body (1) is provided with notch grooves (2) staggered longitudinally and transversely. A preparation method of the matrix type sapphire substrate comprises the following steps of: polishing the sapphire substrate, arranging a light resistor, performing soft baking, exposing, pre-baking and developing, etching the sapphire substrate by ICP (inductively coupled plasma), cleaning the light resistor, performing CMP (chemical mechanical polishing), and cleaning the sapphire substrate. Laser lift-off of the matrix type sapphire substrate from a chip is easily realized, the matrix type sapphire substrate can be repeatedly used, and the cost is saved.

Description

technical field [0001] The invention relates to a sapphire substrate, in particular to a matrix type sapphire substrate and a preparation method thereof, belonging to the field of sapphire. Background technique [0002] For the production of LED chips, the selection of substrate materials is the primary consideration. Which kind of suitable substrate should be used needs to be selected according to the requirements of equipment and LED devices. At present, there are generally three types of materials on the market that can be used as substrates: sapphire substrates, silicon substrates, and silicon carbide substrates. [0003] Single crystal sapphire substrate materials can be used to make blue light / white light / ultraviolet light-emitting diodes and laser diodes, as well as high-frequency microwaves and high-voltage high-power devices. In fact, the role of the single-crystal sapphire substrate material is: as a template to make a single-crystal gallium nitride film (the ene...

Claims

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Application Information

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IPC IPC(8): H01L23/00
Inventor 张保国林岳明
Owner WUXI LUX MATERIAL
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