Van-type no-tillage improved high-yield cultivation method of cold mud field
A cultivation method and mud field technology are applied in the field of van-type no-tillage improvement and high-yield cultivation in cold mud fields, which can solve the problems of soaring prices, difficulty in promotion and application, high labor intensity, etc., so as to improve yield, promote tillering of rice, and increase the temperature of topsoil layer. Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment
[0016] This embodiment takes the shallow hill winter paddy field in the southeastern part of the Sichuan Basin as an example: take the mud surface of the original flat field as the compartment surface, the compartment surface width is 3m, and the length is 8m; 30cm. Spread the mud excavated from the ditch along the length of the car evenly on the entire car surface. Depending on the soil quality, it can be repeated 2-3 times to ensure that the car surface is 15-20cm above the water surface. Rice planting specifications are planted in wide and narrow rows, that is, the narrow row is 20cm, and the wide row is 50cm. Conventional fertilization is used, and 100kg / mu of silicon-calcium fertilizer is added as an amendment.
[0017] Through the field test, the van-type no-tillage rice yield is 568.62kg per mu, the thousand-grain weight is 28.4g, the plant height is 124.73cm, the ear length is 29.32cm, and the number of solid grains is 193.67 grains per ear; the conventional tillage me...
PUM
Property | Measurement | Unit |
---|---|---|
Width | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com