Photoresist pipeline sleeve insulation device
Patent Information
- Authority / Receiving Office
- CN ยท China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SHENYANG KINGSEMI CO LTD
- Publication Date
- 2015-09-09
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Abstract
Description
technical field
[0001] The invention relates to a thermal insulation device for a photoresist pipeline of a coating unit in semiconductor production, in particular to a thermal insulation device for a photoresist pipeline casing. Background technique
[0002] At present, in the semiconductor production process, the photoresist needs to be kept at constant temperature and heat preservation in the glue coating unit. The water inlet and return water of the traditional casing heat preservation system are two independent pipe systems, with more connection points and large volume. , is not convenient for production and maintenance, is easy to leak, and takes up more space. At the same time, single-layer insulation is likely to cause temperature fluctuations and affect process accuracy. In many cases, the replacement of single-layer casings is time-consuming and laborious, which seriously affects production capacity. Sometimes, due to the efficiency of single-pass constant temperat...