Method for improving emissivity of paint film

A technology of emissivity and paint film, applied in sputtering plating, vacuum evaporation plating, ion implantation plating, etc., can solve the problems of high emissivity limitation and achieve high emissivity and good chemical stability

Active Publication Date: 2014-12-24
LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in some special occasions and special application conditions, it is not advisable to add fillers to increase emissivity. For example, in high temperature, strong ultraviolet radiation, space and other environments, the paint film needs to express information such as color and pattern. Such use conditions The color of the paint film is limited, which in turn limits the high emissivity coatings and fillers

Method used

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  • Method for improving emissivity of paint film
  • Method for improving emissivity of paint film

Examples

Experimental program
Comparison scheme
Effect test

example 1

[0029] According to the high emissivity paint film prepared by the above method, by such as figure 2 As shown, the paint film layer and the transparent emissivity adjustment film, wherein the material of the paint film layer is a silicone resin-based coating, the transparent emissivity adjustment film is a silicon dioxide film, and the thickness of the transparent emissivity adjustment film is 200nm.

example 2

[0031] The high-emissivity paint film prepared according to the above method is composed of a paint film layer and a transparent emissivity adjustment film, wherein the material of the paint film layer is a silicone resin-based coating, the transparent emissivity adjustment film is a silicon dioxide film, and the transparent emissivity adjustment The thickness of the film was 300 nm.

example 3

[0033] The high-emissivity paint film prepared according to the above method is composed of a paint film layer and a transparent emissivity adjustment film, wherein the material of the paint film layer is a silicone resin-based coating, the transparent emissivity adjustment film is a silicon dioxide film, and the transparent emissivity adjustment The thickness of the film was 300 nm.

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Abstract

The invention relates to a method for improving emissivity of a paint film. The method comprises the following specific steps: (1) washing the surface of the paint film with an ion source while controlling the washing time to be 1min-10min; (2) plating a transparent emissivity regulating film on the surface of the paint film, wherein the plating is realized by performing sputtering deposition of the transparent emissivity regulating film on the surface of the paint film three times by adopting different sputtering rates. By adopting the method provided by the invention, a high-emissivity transparent film material is prepared on the surface of the paint film by the sputtering method, so that the paint film has high emissivity.

Description

technical field [0001] The invention relates to a method for increasing the emissivity of a paint film, which belongs to the technical field of thin films. Background technique [0002] Emissivity is used to characterize the ability of materials to radiate heat outward, and materials with high emissivity have a strong ability to radiate heat outward. High emissivity materials have important applications in satellite thermal control, energy saving and environmental protection. [0003] High-emissivity coating itself is a relatively mature product, and there are many related researches. Many types of coatings can also achieve the purpose of increasing emissivity by adding high-emissivity fillers. However, in some special occasions and special application conditions, it is not advisable to add fillers to increase emissivity. For example, in high temperature, strong ultraviolet radiation, space and other environments, the paint film needs to express information such as color an...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/54C23C14/58C23C14/08C23C14/10C23C14/35
Inventor 李林许旻王洁冰赵印中吴春华左华平
Owner LANZHOU INST OF PHYSICS CHINESE ACADEMY OF SPACE TECH
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