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Substrate processing apparatus

A technology for processing equipment and substrates, which is applied to conveyor objects, electrical components, electrical solid devices, etc., and can solve problems such as difficulty in ensuring the uniformity of large-scale substrates

Active Publication Date: 2015-04-29
AP SYST INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In particular, when annealing is performed after the thin film is deposited on the substrate, it is difficult to ensure uniformity on large substrates

Method used

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  • Substrate processing apparatus
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Embodiment Construction

[0104] Hereinafter, specific embodiments will be described in detail with reference to the accompanying drawings. However, this invention may be embodied in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. Like reference numbers refer to like elements throughout.

[0105] Figure 4 is a perspective view of a substrate processing apparatus in which a lower exhaust unit is not provided, Figure 5 is a perspective view of a substrate processing apparatus in which a lower exhaust unit is provided according to an exemplary embodiment, Figure 6 is an upper plan view of a substrate transfer unit according to an exemplary embodiment, Figure 7 is according to an exemplary embodiment along the Figure 7 A cross-sectional view of the substrate transfer unit taken along ...

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Abstract

The invention provides a substrate processing apparatus capable of eliminating particles in a substrate processing space. The substrate processing apparatus comprises a cavity shell with the substrate processing space, the substrate processing space is defined by a bottom wall, an upper wall, and a sidewall for connecting the bottom wall to the upper wall, a substrate platform is provided, the substrate platform can move in the first axial direction in the substrate processing space and in the second axial direction intersected with the first axial direction, the substrate processing apparatus also comprises a lower exhaust unit, and the lower exhaust unit is used for exhausting gas between the substrate platform and the bottom wall of the cavity shell.

Description

technical field [0001] The present invention relates to a substrate processing device, in particular to a substrate processing device capable of removing particles in a substrate processing space. Background technique [0002] In the manufacture of liquid crystal displays and solar cells, a heat treatment process for crystallizing an amorphous polycrystalline thin film (for example, an amorphous polycrystalline silicon thin film) is involved. Here, when a substrate having a low melting point is used, laser light may be used to crystallize amorphous polysilicon. [0003] In particular, when annealing is performed after a thin film is deposited on a substrate, it is difficult to ensure uniformity on a large substrate. Therefore, various alternatives have been proposed, one of which is an annealing method of crystallizing amorphous polysilicon by using laser light. figure 1 is a view of a laser processing apparatus according to the related art. [0004] refer to figure 1 , ...

Claims

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Application Information

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IPC IPC(8): H01L21/67H01L21/677
CPCH01L21/6719H01L21/67017H01L21/67115
Inventor 白圣焕李周薰金镐岩金炳秀
Owner AP SYST INC