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Substrate liquid processing device and substrate liquid processing method

A processing liquid and liquid processing technology, which is applied in the field of concentration adjustment of processing liquid and substrate liquid processing device, and can solve the problems of insufficient supply management and other problems.

Active Publication Date: 2019-06-11
TOKYO ELECTRON LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In the case where the concentration of the treatment liquid must be controlled at a low concentration within a small allowable range, the supply amount management based on the set flow rate and supply time of each LFC may not be sufficient.

Method used

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  • Substrate liquid processing device and substrate liquid processing method
  • Substrate liquid processing device and substrate liquid processing method
  • Substrate liquid processing device and substrate liquid processing method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] Hereinafter, embodiments of the invention will be described with reference to the drawings.

[0029] like figure 1 As shown, the liquid processing apparatus has a plurality of processing units (liquid processing units) 16 for liquid processing a substrate and a processing fluid supply source 70 for supplying processing liquid to the processing units 16 .

[0030] The treatment fluid supply source 70 has a tank 102 for storing the treatment liquid, and a circulation line 104 drawn from the tank 102 and returned to the tank 102 . A pump 106 is provided on the circulation line 104 . A pump 106 creates a recycle flow that is drawn from the tank 102 and returns to the tank 102 through a recycle line 104 . A filter 108 for removing pollutants such as fine particles contained in the treatment liquid is provided in a portion of the circulation line 104 on the downstream side of the pump 106 . Auxiliary machines (for example, heaters, etc.) may also be provided on the circul...

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PUM

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Abstract

The present invention provides a substrate liquid processing apparatus and a substrate liquid processing method for supplying a processing liquid of a precise concentration to a substrate. The substrate liquid processing apparatus includes: a tank (102); a circulation line (104); and a processing unit (16) connected to the circulation line via a branch line (112) for performing treatment on a substrate using the treatment liquid flowing in the circulation line Liquid treatment; treatment liquid generation mechanism (206A, 206B, 208), which is used to mix the raw material liquids supplied from the respective supply sources of at least two kinds of raw material liquids at a controlled mixing ratio to generate a treatment liquid; concentration measuring device (212 (or 212')) for measuring the concentration of the treatment liquid flowing in the circulation line and the concentration of the treatment liquid flowing in the treatment liquid supply line; and a control device (4) for treating based on the measured The concentration of the liquid is used to control the processing liquid generation mechanism.

Description

technical field [0001] The present invention relates to a technology for adjusting the concentration of a processing liquid in a substrate liquid processing apparatus for performing predetermined liquid processing on a substrate using a processing liquid obtained by mixing a plurality of raw material liquids in a predetermined ratio. Background technique [0002] Liquid processing such as cleaning and etching performed by supplying a processing liquid to a substrate is also included in the manufacturing process of a semiconductor device. In order to perform such liquid processing, for example, a liquid processing system including a plurality of liquid processing units as described in Patent Document 1 can be used. [0003] The liquid treatment system described in Patent Document 1 includes a tank for storing a treatment liquid, a circulation line connected to the tank, and a pump for circulating the treatment liquid stored in the tank through the circulation line. A plurali...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/67B01F15/04B01F3/08
CPCG05D11/138H01L21/02041H01L21/30604H01L21/6704H01L21/67075H01L21/67253
Inventor 高木康弘小宫洋司信国力佐竹圭吾穴本笃史
Owner TOKYO ELECTRON LTD