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Purging apparatus and purging method

A technology for purifying device and purifying gas, applied in the field of container device, can solve the problems of complicated structure of purification device, adjustment of actuator, troublesome maintenance, etc.

Inactive Publication Date: 2016-08-24
MURATA MASCH LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] If it is installed as in Patent Document 1, the structure of the cleaning device becomes complicated because the nozzle is raised and lowered by an actuator.
In addition, the actuator needs to be controlled, and the adjustment and maintenance of the actuator become troublesome.

Method used

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  • Purging apparatus and purging method
  • Purging apparatus and purging method
  • Purging apparatus and purging method

Examples

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Embodiment Construction

[0027] The best examples for carrying out the present invention are shown below. The scope of the present invention should be determined based on the description of the scope of the claims, with reference to the description in the specification and known technologies in the field, and based on the understanding of those skilled in the art.

[0028] Figure 1 to Figure 6 A purification device 20 of an embodiment is shown. figure 1 Indicates the bottom surface of FOUP2 to be purged, and the purge gas is nitrogen or clean and dry air. The container to be purified is not limited to FOUP, and the items stored in the container are not limited to semiconductor wafers, and reticles, etc. may also be used. FOUP2 has, for example, four receiving holes 4 for receiving nozzles of purge gas, valves 6 and 7 are arranged at the bottom of the receiving holes 4, valve 6 is used for introducing purge gas, and valve 7 is used for exhaust, but valve 6, valve 7 It can also be absent.

[0029] ...

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Abstract

A container is mounted at a predetermined position in a purging apparatus so as to prevent the container from being caught by a nozzle. When the container is lowered and mounted in the purging apparatus, two facing sides at the front edge of the bottom surface of the container and at the front edge of a recess portion and two facing sides on both right and left side edges of the bottom surface of the container are guided using a front portion guide, a side portion guide, and a center guide. Next, the nozzle is brought into contact with the bottom surface of the container.

Description

technical field [0001] The present invention relates to a device and a cleaning method for cleaning containers such as FOUPs (front opening unified pods). Background technique [0002] Purge gas such as nitrogen gas or clean dry air is injected from a nozzle into a container such as a FOUP that houses semiconductor wafers to purify the inside of the container. Although the operation of fitting the pin into the positioning recess at the bottom of the container is performed for the positioning of the container, there are some containers in which the receiving hole of the nozzle is deeper than the positioning recess. In such a container, the height of the nozzle is higher than the pin, and there is a problem that the nozzle is caught by the container and cannot be positioned. [0003] Patent Document 1 (JP2011-187539) proposes to provide an actuator for raising and lowering the nozzle in the cleaning device, and to position the container with a pin while the nozzle is lowered,...

Claims

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Application Information

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IPC IPC(8): H01L21/677
CPCH01L21/67379H01L21/67393H01L21/67017H01L21/67389H01L21/67769H01L21/67772
Inventor 村田正直山路孝
Owner MURATA MASCH LTD