A kind of high-transparency optical film and its preparation method

An erasing film and high-transparency technology, applied in optics, optical components, instruments, etc., can solve problems such as deterioration of electronic components, easy penetration of water vapor, and high cost of coating films, so as to improve flexibility and improve vision effect, the effect of improving the refractive index

Active Publication Date: 2019-05-21
NINGBO SOKEN CHEM
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For example, the base film of the conductive film, that is, the disappearing film is made by superimposing multiple layers of high and low refraction layers on one side; or the disappearing film is made by coating high and low refraction layers on both sides; The number of layers is too many, too thick, the cost of coating film is high, and the film is easy to crack; and the transmittance is low, between 85% and 90%.
[0003] Transparent films are used instead of glass plates in order to reduce thickness, weight, and flexibility. However, transparent films have the following problems: easily permeating water vapor, and easily causing deterioration of components inside electronic components.

Method used

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  • A kind of high-transparency optical film and its preparation method
  • A kind of high-transparency optical film and its preparation method
  • A kind of high-transparency optical film and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0032] Preparation of IM layer coating solution: 100 parts by mass of dipentaerythritol pentaacrylate, 20 parts by mass of zinc sulfide with a particle size of 0.08 μm, 30 parts by mass of calcium fluoride with a particle size of 0.01 μm, 100 parts by mass of zinc sulfide with a particle size of 0.3 μm Zinc oxide, use 100 parts by mass of propylene glycol monomethyl ether as a diluting solvent, then add 650 parts by mass of methyl ethyl ketone for dilution, and 0.5 parts by mass of 2-hydroxyl 2-methyl 1-phenylacetone to obtain a solid content of 25%. The IM layer coating solution.

[0033] Preparation of hard coating solution: 100 parts by mass of acrylic hardened resin coating solution, add 1 part by mass of trimethylchlorosiloxane, 50 parts by mass of toluene and 0.1 part by mass of benzophenone, and mix well to obtain the solid content It is 35.8% hardcoating solution.

[0034] Wherein the acrylic hardened resin coating solution is a mixture of 50 parts by mass of trimethy...

Embodiment 2

[0037] Prepare the IM layer coating solution: 100 parts by mass of dipentaerythritol tetraacrylate, 20 parts by mass of zinc sulfide (0.05 μm in particle size), 30 parts by mass of calcium fluoride (0.1 μm in particle size), 100 parts by mass of titanium oxide (0.2 μm in particle size μm), using 100 parts by mass of ethyl acetate as a diluting solvent, then adding 650 parts by mass of cyclohexanone for dilution and 1.0 parts by mass of diphenyl ethyl ketone, and mixing evenly to obtain an IM layer coating solution with a solid content of 25%.

[0038] Preparation of hard coating solution: 100 parts by mass of acrylate hard resin coating solution, add 3 parts by mass of trimethylchlorosiloxane, 30 parts by mass of cyclohexanone and 0.5 part by mass of methyl benzoylformate, mix After uniformity, a hardcoat coating solution with a solid content of 28.5% was obtained.

[0039] The acrylate hardening resin coating solution is a mixture of 32 parts by mass of dipentaerythritol pent...

Embodiment 3

[0042] Prepare the IM layer coating solution: get 100 parts by mass of dipentaerythritol hexaacrylate, 20 parts by mass of zinc sulfide (0.05 μm in particle size), 30 parts by mass of calcium fluoride (0.1 μm in particle size), 100 parts by mass of zirconia (particle size in 0.3 μm), 50 parts by mass of zinc oxide (particle size 0.2 μm), using 100 parts by mass of propylene glycol monomethyl ether as a dilution solvent, then adding 650 parts by mass of methyl ethyl ketone for dilution and 0.8 parts by mass of 2-hydroxyl 2-methyl ether Base 1-phenylacetone, after mixing evenly, the IM layer coating solution with a solid content of 28.6% was obtained.

[0043] Preparation of hard coating solution: 100 parts by mass of acrylic hardening resin coating solution, adding 5 parts by mass of trimethylchlorosiloxane, 15 parts by mass of methyl ethyl ketone and 0.3 parts by mass of methyl benzoylformate and mix uniformly to obtain a hardcoat coating solution with a solid content of 50.0%...

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Abstract

The invention relates to an optical high transmittance shadow elimination film and a manufacturing method thereof. The optical high transmittance shadow elimination film is characterized by comprising an optical transparent base film, wherein a stiffening layer with thickness of 1-4 mum is composed on a first surface of the base film, an IM layer with thickness of 0.5-2mum is composed on a second surface of the base film, mass components of the IM layer comprise acrylates 100 parts, photoinitiator 0.5-1.0 parts, corpuscules 150-200 parts, and a first solvent 250-900 parts, a particle size of the corpuscules is 0.01-0.3mum, the corpuscules comprise metal oxide, calcium fluoride and zinc sulfide which are in a proportion of 10-15:3:2, mass components of the stiffening layer comprise acrylates+hard resin coating liquid 100 parts, photoinitiator 0.1-0.5 parts, trimethylchlorosilane 1-5 parts, and a second solution 12.5-50 parts, and mass components of the acrylates+hard resin coating liquid comprise acrylic resin 100 parts, silica 5-15 parts and a third solvent 90-210 parts.

Description

technical field [0001] The invention relates to a coating film for a touch screen, in particular to an optical high-transparency shadow-eliminating film and a preparation method thereof. Background technique [0002] When the transparent conductive film is applied to a touch screen, especially a capacitive touch screen, the etching pattern on the surface has a great influence on the visual effect. There are corresponding technologies on the market to reduce the visibility of etching lines. For example, the base film of the conductive film, that is, the disappearing film is made by superimposing multiple layers of high and low refraction layers on one side; or the disappearing film is made by coating high and low refraction layers on both sides; The number of layers is too many, too thick, the cost of coating film is high, and the film is easy to crack; and the transmittance is low, between 85% and 90%. [0003] A transparent film is used instead of a glass plate for thinni...

Claims

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Application Information

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Patent Type & AuthorityPatents(China)
IPC IPC(8): G02B1/14C09D4/02C09D4/06C09D7/61G06F3/044
CPCC09D4/06C09D7/61C09D7/63G02B1/14G06F3/044
Inventor陆建贤
OwnerNINGBO SOKEN CHEM