A uv imposition process of a wide-width holographic molded master

A master, wide-format technology, applied in the field of UV imposition technology of wide-format holographic stamping masters, can solve the problems of inconvenient operation, unstable anti-static effect, lower imposition pass rate, etc., so as to reduce the probability of static electricity and improve adhesion. Stability, improve the effect of imposition pass rate

Active Publication Date: 2019-03-22
WUHAN HUAGONG IMAGE TECH & DEV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The shortcomings of the current process are: (1) Due to the differences in production and storage, the local adhesion of the base film may decrease, and the holographic pattern will be missing due to easy degumming, and the pass rate of the imposition is low; (2) The plastic base film is a material that is prone to static electricity , during the UV imposition operation, due to the repeated lamination of the plastic master and the plastic base film and the roller coating of the coating roller, the base film and the master are more likely to generate static electricity, and the film or layout with static electricity is very easy Adsorb impurities such as dust, skin shavings or floating objects in the air. During UV imposition operation, if such impurities are mixed into the UV-cured pattern, it will cause apparent defects in the imposition and reduce the pass rate of the imposition, especially for wide-format imposition due to operation. If the time is long, such defects are more likely to occur, which makes the qualification rate of spelling out wide and large versions lower
For this reason, the existing method is to adopt a variety of antistatic measures, such as using a destaticizing air gun to remove static electricity before each imposition operation, which brings inconvenience to the operation in practical applications, and the destaticizing effect is unstable ; There is also direct use of antistatic plastic base film for imposition, but when the first layer of UV pattern layer is covered, the antistatic property of the surface of the UV pattern layer is very poor again. The UV pattern layer of the base film and the UV pattern layer of the transparent master are still prone to static electricity, which seriously affects the imposition quality and the pass rate of the imposition

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  • A uv imposition process of a wide-width holographic molded master
  • A uv imposition process of a wide-width holographic molded master
  • A uv imposition process of a wide-width holographic molded master

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Embodiment Construction

[0037] The embodiments of the present invention will be further described below in conjunction with the accompanying drawings. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar symbols throughout represent the same or similar elements or elements with the same or similar functions. The embodiments described below by referring to the accompanying drawings are exemplary and are intended to explain the present invention, but should not be construed as limiting the present invention. Any modifications, equivalent replacements or Improvements, etc., should be included within the scope of the claims of the present invention, and those not described in detail in this technical solution are all known technologies.

[0038] see Figure 1~4 , the invention discloses a UV imposition process of a wide-width holographic molded master, the obtained wide-width holographic molded master has strong adhesion of the UV cured coating, high imposition ...

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Abstract

The invention discloses a UV makeup process for a broad-width holographic embossing mother set. Antistatic treatment layers are manufactured at a transparent mother set and a plastic basement membrane of a unit board by using a UV makeup adhesive with the antistatic property. The process comprises: making a film sheet; making a mother set and an antistatic treatment layer of a plastic basement membrane; copying the pattern of the mother set unit one by one at the antistatic treatment layer of the plastic basement membrane by using an antistatic UV makeup adhesive until completing all makeup; and carrying out metallization processing to form a metal layer to obtain a broad-width holographic embossing mother set. The Plastic basement membrane thickness is 0.1 to 0.2mm; and the surface resistance value of the anti-static UV makeup coating after curing is 5*10<6>omega. The makeup adhesive has the antistatic property, so that the static electricity generation probability during the whole makeup process can be reduced, floating impurity absorption in air can be avoided, and the makeup quality and the makeup yield can be improved. With the antistatic treatment layer, the attachment stability of the UV makeup adhesive to the basement membrane can be improved, the makeup yield can be improved, and the makeup efficiency can be enhanced.

Description

technical field [0001] The invention relates to a UV imposition process of a wide-width holographic molded master, in particular to a UV imposition process of a wide-width holographic molded master. Background technique [0002] In molded holographic technology, the most important process includes making holographic molded master. In the process of mass production of molded holographic products, it is often required that the holographic molded master has a larger size, that is, a wide holographic molded master. In the prior art, there are mainly two imposition processes for wide-format holographic molded masters, one is mechanical imposition, and the other is UV imposition. The UV imposition process generally includes: making a transparent plastic master of the unit plate, and using the transparent plastic master to perform UV imposition operations on the plastic base film (PET, PC). The shortcomings of the current process are: (1) Due to the differences in production and s...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03H1/02G03F7/00B41N1/24B41N1/12
CPCB41N1/12B41N1/242G03F7/0002G03H1/028G03H2001/0284
Inventor 杨兴国徐晓光鲁琴张静周毅
Owner WUHAN HUAGONG IMAGE TECH & DEV
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