Flocked face preparation method for black silicon battery

Abstract

The application provides a flocked face preparation method for a black silicon battery, which comprises the steps of: spin-coating photoresist on the surface of a silicon chip to manufacture a photoresist face; carrying out laser exposure on the photoresist face; carrying out structural preprocessing on the photoresist face subjected to laser exposure; manufacturing a metal layer on the photoresist face subjected to structural preprocessing; washing off a photoresist layer; and carrying out wet etching on the silicon chip to form a black silicon flocked face. The preparation method provided bythe application is simple in preparation process; the obtained black silicon flocked face is controllable in size of a nano-pore structure; controllability of preparation of the nano flocked face isimproved; the preparation method has repeatability; and absorption of light can be greatly improved.

Description

technical field [0001] The invention belongs to the technical field of solar energy, in particular to a method for preparing a suede surface of a black silicon battery. Background technique [0002] At present, the photovoltaic industry is still dominated by crystalline silicon solar cells. In order to improve the absorption of incident light by solar cells, commercial monocrystalline and polycrystalline silicon wafers generally adopt surface texture treatment. The surface texture of a single wafer is a pyramid structure, and the surface of a multi-chip The suede is a worm-like structure, and its light absorption rate in the visible range can reach about 88% and 80%, respectively, but the reflectance of the battery surface is still high, especially in the ultraviolet and infrared bands. Researchers found that when the size of the textured structure on the surface of crystalline silicon is reduced to the nanometer level, the surface of the obtained silicon wafer is black, whi...

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