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Film coating device and film coating method

A coating device and coating area technology, which is applied in the field of coating devices, can solve problems affecting the vacuum air field environment, vacuum chamber pollution, and affecting the utilization rate of sputtering targets, etc.

Pending Publication Date: 2020-04-21
德运创鑫(北京)科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the carrier used in traditional magnetron sputtering often causes the vacuum chamber to be polluted, affects the vacuum air field environment, and even affects the utilization rate of the sputtering target during the magnetron sputtering process.

Method used

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  • Film coating device and film coating method
  • Film coating device and film coating method
  • Film coating device and film coating method

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Embodiment Construction

[0071] In order to make the purpose, technical solution and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present application, and are not intended to limit the present application.

[0072] see figure 1 , the present application provides a coating device 10 , which may include at least two carriers 100 , at least two sensors 600 and a transmission control device 700 . Seamless overlapping can be realized between adjacent carriers 100 . At least two sensors 600 are arranged at intervals and are electrically connected to the transport control device 700 , which can be used to detect the position information of the carrier 100 and send the detected position information of the carrier 100 to the transport control device 700 . The transmission control dev...

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Abstract

The invention relates to a film coating device and a film coating method. The film coating device comprises at least two carriers, a chamber, at least two sensors and a transmission control device. According to the position information, detected by the sensors, of the carriers, the transmission control device can control the movement speeds of the carriers, and therefore the carriers are controlled to achieve the seamless lap joint aim in a film coating area, and it is avoided that the adjacent carriers are spaced in the film coating area and the sputtering process is affected.

Description

technical field [0001] The present application relates to the field of coating technology, in particular to a coating device and a coating method. Background technique [0002] ITO (Indium Tin Oxide, tin-doped indium oxide or indium tin oxide) thin film is an n-type semiconductor with high visible light transmittance and guiding rate, and has good adhesion to most substrates, and has relatively high Strong hardness and good resistance to acid, alkali and organic solvents. Because of its good physical and chemical properties, it is widely used in optoelectronic devices, such as liquid crystal displays, solar cells, plasma displays, etc. [0003] There are many methods for preparing ITO thin films, such as spray coating, vacuum evaporation, chemical vapor deposition, reactive particle ionization, magnetron sputtering, etc. Since magnetron sputtering has good controllability and is easy to obtain large-area uniform films, it is widely used. However, the carrier used in tradi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/50C23C14/35C23C14/54
CPCC23C14/50C23C14/35C23C14/54
Inventor 杨肸曦
Owner 德运创鑫(北京)科技有限公司