PVD coating method and PVD coating device

A coating device and coating technology, applied in the direction of sputtering coating, ion implantation coating, vacuum evaporation coating, etc., can solve the problems that the same time cannot be guaranteed, the color of the film is uneven, and the uniformity of the thickness of the film layer is affected. Improved film thickness uniformity, simple structure, and improved uniformity

Inactive Publication Date: 2021-01-29
VITALNK IND SHENZHEN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the traditional method of controlling the opening time of the deposition source often cannot guarantee that the time for the object to be plated on the turret to pass through the effective area of ​​the deposition source is the same due to timer errors and other reasons, which affects the uniformity of the film thickness. property, resulting in uneven color of the film

Method used

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  • PVD coating method and PVD coating device
  • PVD coating method and PVD coating device
  • PVD coating method and PVD coating device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0094] Embodiment 1 uses a PVD coating device to deposit and form a color layer

[0095] 1) Set the number of rotations of the turret to 36.

[0096] 2) Start the control program, start the turret, and when the position detection sensor detects the metal detection piece for the first time, turn on the working gas and the reaction gas, feed the working gas and the reaction gas into the vacuum coating chamber, and turn on the bias power supply; When the position detection sensor detects the metal detection piece for the second time, turn on the power of the target, and start to accumulate the number of turns of the turret rotation. When the position detection sensor detects the metal detection piece again, it will accumulate 1 circle.

[0097]3) When the cumulative number of turns reaches 36 turns, the coating control module turns off the target power supply and bias power supply in sequence, stops feeding the working gas and reaction gas, and turns the frame to complete the coa...

Embodiment 2

[0101] Embodiment 2 adopts PVD coating device to deposit and form color layer

[0102] 1) Set the number of rotations of the turret to 48.

[0103] 2) Start the control program, start the turret, and when the position detection sensor detects the metal detection piece for the first time, turn on the working gas and the reaction gas, feed the working gas and the reaction gas into the vacuum coating chamber, and turn on the bias power supply; When the position detection sensor detects the metal detection piece for the second time, turn on the power of the target, and start to accumulate the number of turns of the turret rotation. When the position detection sensor detects the metal detection piece again, it will accumulate 1 circle.

[0104] 3) When the cumulative number of laps reaches 48, the coating control module turns off the target power supply and bias power supply in sequence, stops feeding the working gas and reaction gas, and turns the frame to complete the coating. Th...

Embodiment 3

[0106] Embodiment 3 adopts PVD coating device to deposit and form color layer

[0107] 1) Set the number of turns of the turret to 96.

[0108] 2) Start the control program, start the turret, and when the position detection sensor detects the metal detection piece for the first time, turn on the working gas and the reaction gas, feed the working gas and the reaction gas into the vacuum coating chamber, and turn on the bias power supply; When the position detection sensor detects the metal detection piece for the second time, turn on the power of the target, and start to accumulate the number of turns of the turret rotation. When the position detection sensor detects the metal detection piece again, it will accumulate 1 circle.

[0109] 3) When the cumulative number of turns reaches 96 turns, the coating control module turns off the target power supply and bias power supply in turn, stops feeding the working gas and reaction gas, and turns the frame to complete the coating. The...

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Abstract

The invention relates to a PVD coating method and a PVD coating device. According to the method, the coating time is controlled by controlling the number of rotating turns of coating workpieces in thecoating process. According to the method, due to the fact that the coating time is controlled by controlling the number of rotating turns of the coating workpieces in the coating process, it can be effectively guaranteed that the times for the coating workpieces to pass through a deposition source effective area within the deposition starting time are the same, and therefore the film thickness uniformity of a film layer in the circumferential direction of a rotating stand is improved.

Description

technical field [0001] The invention relates to the technical field of film preparation, in particular to a PVD coating method and a PVD coating device. Background technique [0002] Physical vapor deposition (Physical Vapor Deposition, PVD) is an important and common vacuum coating method, which has the advantages of low temperature preparation, high process stability, easy control of film elements and structure, less impurity content, and a wide range of substrates. It can be produced in a large area, and the process method is clean and environmentally friendly. It is widely used in the fields of hard, wear-resistant, corrosion-resistant, optical and other functional coatings and colorful decorative coatings. [0003] In the process of mass production of thin films, in order to pursue mass production of thin films, the object to be plated is usually placed on a planetary revolving frame, and deposition devices such as evaporation sources or sputtering sources are placed ou...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/54C23C14/50
CPCC23C14/542C23C14/505
Inventor 陈坚毅尹万锋薛涛
Owner VITALNK IND SHENZHEN
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