The invention relates to a method for preparing Al/Ni reaction laminated foil by EBPVD (electron beam physical vapor deposition), and aims to solve the technical problems that a current Al/Ni laminated foil preparation method is low in production efficiency and high in production cost, impurities are easily led into an Al/Ni layer interface, pollution is caused, and higher self-propagating speed cannot be obtained. The method includes the steps: firstly, previous preparation of EBPVD; secondly, ingot preheating; thirdly, deposition layer separation; fourthly, laminated foil deposition. The Al/Ni reaction laminated foil is uniform in structure, the layer thickness can be controlled, the interface is complete and clear, pollution is avoided, production efficiency is high, cost is low, the temperature of various substrates can be lower than 160 DEG C in the preparation process, combustion of the Al/Ni reaction laminated foil is avoided, and the Al/Ni reaction laminated foil prepared by the method can release great heat in a self-propagating mode within a short time and can be applied to the field of special welding.