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Nano-material transfer deposition method

A technology of nanomaterials and deposition methods, applied in the field of assembly and manufacturing of micro-nanostructures, can solve the problems of introducing impurities, optimizing the electrical and mechanical properties of nanomaterials, etc.

Active Publication Date: 2013-09-11
SUN YAT SEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The advantage of the electrophoresis method is that it can control the thickness and surface morphology of the film by controlling the deposition time and the concentration of the suspension. However, this method, like the spin coating method, will introduce impurities, which is unfavorable for optimizing the electrical and mechanical properties of nanomaterials. Widely used in device structure

Method used

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Examples

Experimental program
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Effect test

Embodiment 1

[0035] In this example, a graphene oxide film will be deposited on a flat silicon substrate. The specific process is as follows:

[0036] 1) Mix flake graphene oxide with high-purity water at a ratio of 1 mg / mL, put it into an ultrasonic machine and oscillate and disperse for 5 hours to form a graphene oxide suspension;

[0037] 2) Turn on the power of the oil bath heating pot to keep it at a constant temperature of 100°C;

[0038] 3) the glass container that the graphene oxide suspension is housed is placed in an oil bath and heated at a constant temperature of 100°C;

[0039] 4) Select a 1cm×1cm (100) single crystal silicon wafer with a flat surface as the substrate;

[0040] 5) Fix the substrate on the plastic support, put the substrate together with the plastic support into the graphene oxide suspension, make the front of the substrate face the liquid surface of the suspension, and the angle between the substrate surface and the liquid surface is 0° , the distance betwe...

Embodiment 2

[0044] In this example, graphene oxide films will be deposited for different times on a flat silicon substrate, and their thicknesses will be characterized. The specific process is as follows:

[0045] 1) Mix flake graphene oxide with high-purity water at a ratio of 1 mg / mL, put it into an ultrasonic machine and oscillate and disperse for 5 hours to form a graphene oxide suspension;

[0046] 2) Turn on the power of the oil bath heating pot to keep it at a constant temperature of 100°C;

[0047] 3) the glass container that the graphene oxide suspension is housed is placed in an oil bath and heated at a constant temperature of 100°C;

[0048] 4) Select a 1cm×1cm (100) single crystal silicon wafer with a flat surface as the substrate;

[0049] 5) Put the substrate on a plastic support, put the substrate together with the plastic support into the graphene oxide suspension, make the front of the substrate face the liquid surface of the suspension, and the angle between the substrat...

Embodiment 3

[0053] In this embodiment, the graphene oxide film 2 will be deposited on the concave-convex groove-shaped microstructure array 1 of the silicon wafer, such as Figure 4 shown. The pitch and width of the concave-convex groove-like microstructure are 20 μm, and the length is 2 mm. The specific process is as follows:

[0054] 1) Prepare a concave-convex groove-shaped microstructure array 1 on a 1cm×1cm n-type silicon wafer;

[0055] 2) Mix flake graphene oxide with high-purity water at a ratio of 1 mg / mL, put it into an ultrasonic machine and oscillate and disperse for 5 hours to form a graphene oxide suspension;

[0056] 3) Turn on the power of the oil bath heating pot to keep it at a constant temperature of 100°C;

[0057] 4) the glass container that the graphene oxide suspension is housed is placed in an oil bath and heated at a constant temperature of 100°C;

[0058] 5) Select the concave-convex groove-shaped microstructure array 1 obtained in step 1) as the substrate; ...

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Abstract

The invention discloses a nano-material transfer deposition method. The method comprises the following steps: a nano-material is mixed with a solution to form a suspension, and the mixed suspension is heated for realizing the carrying of the nano-material by evaporated solution molecules, so the nano-material adheres to the surface a substrate placed above the liquid surface of the mixed suspension to form a film obtained through stacking the nano-material layer upon layer. The nano-material film having different thickness can be prepared through controlling the deposition time, the concentration of the nano-material in the suspension, the distance between the substrate and a sample and the heating temperature.

Description

technical field [0001] The invention relates to the technical field of assembly and manufacture of micro-nano structures, in particular to a nanomaterial transfer deposition method. Background technique [0002] The existing nanomaterial transfer and assembly technologies mainly include titration method, spray method, spin coating method, electrophoretic deposition method, vacuum filtration method, and L-B assembly method, among which spin coating method, electrophoretic deposition method, and vacuum filtration method are widely used. The spin coating method is to add a surfactant with a certain viscosity to the mixed suspension of nanomaterials and liquid, then drop it on the substrate, and fix the substrate on the turntable of the homogenizer, rotate at high speed, and the liquid volatilizes the nanomaterials film forming. The advantage of the spin coating method is that the thickness of the film can be controlled by controlling the rotation time, rotation speed, drop vol...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C26/00B05D1/00
Inventor 佘峻聪黄媛邓少芝许宁生
Owner SUN YAT SEN UNIV
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