Supercharge Your Innovation With Domain-Expert AI Agents!

Scratch depth measuring device and method

A technology of scratch depth and measuring device, which is applied in the field of measurement and can solve the problems such as the inability to meet the requirements of high-precision and flexible measurement of curved structures

Active Publication Date: 2021-06-11
COMAC +1
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, existing measurement equipment and methods cannot meet the high-precision and flexible measurement requirements for a large number of curved surface structures

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Scratch depth measuring device and method
  • Scratch depth measuring device and method
  • Scratch depth measuring device and method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0033] In order to better understand the technical solutions of the present invention, the embodiments of the present application will be described in detail below in conjunction with the accompanying drawings.

[0034] It should be clear that the described embodiments are only part of the embodiments of the present application, rather than listing all the embodiments. Based on the embodiments described in the present disclosure, all other variations obtained by persons of ordinary skill in the art without making customary labors belong to the protection scope of the present application.

[0035] figure 1 An optical diagram of a scratch depth measurement scheme 100 according to an aspect of the present disclosure is shown. Such as figure 1 As shown in , in the scratch depth measurement scheme 100 , the light source 102 emits light, which is converged by the convex lenses 104 and 106 and then irradiates onto the blocking plate 108 to form a half-bright and half-dark pattern. ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a scratch depth measuring device. The device comprises a light path subsystem, an adjusting subsystem and an imaging subsystem, wherein the light path subsystem comprises a light source and a blocking piece and is used for generating parallel light which is partially blocked so as to irradiate a measured surface; the adjusting subsystem is used for adjusting the irradiation angle of the part of the shielded parallel light irradiating the measured surface; and the imaging subsystem comprises a camera and a data processing part, the camera is used for collecting a semi-bright and semi-dark image of the measured surface, and if the collected semi-bright and semi-dark image has a protruding part with a bottom edge on a light and dark boundary and a sharp point, the data processing part determines a depth of a scratch on the measured surface based at least in part on the irradiation angle and measurement of a distance between the sharp point and a light and dark boundary in the image. Other aspects of the invention include a corresponding scratch depth measurement method and the like.

Description

technical field [0001] The present disclosure generally relates to the field of measurement technology, and in particular to the detection of the depth of scratches on the surface of objects. Background technique [0002] In the field of modern manufacturing, especially in the field of civil aircraft, due to improper protection and other reasons during the manufacturing process, it is easy to cause scratches on the surface of the machine parts. Usually, the width of the scratch is small, and it is difficult for the existing measuring device to accurately measure the depth of the scratch on the surface of the machine part, so that the scratch engineering disposal personnel cannot accurately judge the severity of the damage, thus affecting the correct disposal of the scratch. [0003] For example, one type of prior art scratch depth measurement technique is mechanical contact direct measurement. Equipment using this type of technology will cause secondary damage to the measur...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G01B11/22
CPCG01B11/22
Inventor 闻捷陶思危苟鹏坡
Owner COMAC
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com