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NOR flash memory manufacturing method, circuit and application thereof

A manufacturing method and flash memory technology, applied in circuits, electrical components, electrical solid state devices, etc., can solve the problems of inability to meet the needs of complex circuits and more aluminum pad wiring, inability to meet the needs of metal wiring, and high production costs. The effect of photolithography and etching accuracy, short cycle and low production cost

Pending Publication Date: 2021-12-17
HEFEI HENGSHUO SEMICON CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The traditional Nor flash memory process only has three metal layers available. With the development of the process, the area of ​​the chip with the same capacity is getting smaller and smaller, but the functions that the chip can provide have increased. At the same time, under the requirements of advanced packaging, The number of aluminum pads (Al Pad) required for package bonding is also increasing, so the traditional Nor flash memory three-layer metal layer process cannot meet the needs of complex circuits and more aluminum pad wiring
[0004] At present, packaging factories in the industry provide a wafer-level packaging process (WLP). After the wafer process is completed, more aluminum pads are re-arranged on the surface of the wafer by adding process steps to meet different packaging requirements. The solution cannot meet the requirements of metal wiring with complex functional circuit design, and the production cost is high, the cycle is long, and the flexibility is poor. It can only meet the needs of arranging more aluminum pads.

Method used

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  • NOR flash memory manufacturing method, circuit and application thereof
  • NOR flash memory manufacturing method, circuit and application thereof
  • NOR flash memory manufacturing method, circuit and application thereof

Examples

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Effect test

Embodiment 1

[0041] Such as Figure 1-11 As shown, the manufacturing method of a kind of NOR flash memory that this embodiment provides, please refer to figure 1 Since this method includes using the existing process to prepare flash memory unit 2 on silicon wafer substrate 1, covering and preparing inner layer insulating layer 3 on flash memory unit 2, and covering and preparing first metal Layer 4, the second metal layer 5 and the third metal layer 6, such as the deposition of tunnel oxide layer and floating gate included in the preparation of flash memory unit 2, etching of the floating gate, tunnel oxide layer and silicon wafer substrate to form shallow trenches The tank may also contain the exposure and development, ion implantation, ashing, and cleaning steps included in the zero-threshold voltage tube ion implantation process disclosed in the applicant's previous patent application. Therefore, in the embodiment, the same steps as those in the prior art And the parameters will not be...

Embodiment 2

[0053] This implementation provides a NOR flash memory circuit, including a wafer of a Nor flash memory circuit provided with a flash memory unit and three metal layers, and also includes a fourth metal layer prepared by the method as in Example 1 on the surface of the wafer.

Embodiment 3

[0055] This embodiment provides a chip, including the NOR flash memory circuit described in Embodiment 2.

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PUM

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Abstract

The invention relates to the technical field of semiconductor manufacturing, and discloses a NOR flash memory manufacturing method, circuit and application thereof. The method comprises the steps that on the basis of a wafer of a NOR flash memory circuit with a flash memory unit and three metal layers, a third metal layer is covered with a fourth metal layer communicated with the third metal layer. The method disclosed in the invention is compatible with the existing process. The metal wiring requirement of the Nor flash memory chip with more complex functions can be met, feasible preconditions are provided for arranging more aluminum pads to meet the requirement of advanced packaging pressure welding, and the practical value in practical significance is achieved.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a manufacturing method, circuit and application of a NOR flash memory. Background technique [0002] The characteristic of Nor flash memory is that it is executed in the chip, so that the application program can run directly in the flash memory without having to read the code into the system RAM. The transmission efficiency of NOR flash memory is very high, and it has high cost-effectiveness in the small capacity of 1-16MB. [0003] The traditional Nor flash memory process only has three metal layers available. With the development of the process, the area of ​​the chip with the same capacity is getting smaller and smaller, but the functions that the chip can provide have increased. At the same time, under the requirements of advanced packaging, The number of aluminum pads (Al Pad) required for package bonding is also increasing, so the traditional Nor flash ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/768H01L23/538H01L27/11521H01L27/11568H10B41/30H10B43/30
CPCH01L21/76895H01L23/5386H10B43/30H10B41/30
Inventor 任军徐培吕向东盛荣华李政达
Owner HEFEI HENGSHUO SEMICON CO LTD
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