NOR flash memory manufacturing method, circuit and application thereof
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- HEFEI HENGSHUO SEMICON CO LTD
- Publication Date
- 2021-12-17
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Abstract
Description
technical field
[0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a manufacturing method, circuit and application of a NOR flash memory. Background technique
[0002] The characteristic of Nor flash memory is that it is executed in the chip, so that the application program can run directly in the flash memory without having to read the code into the system RAM. The transmission efficiency of NOR flash memory is very high, and it has high cost-effectiveness in the small capacity of 1-16MB.
[0003] The traditional Nor flash memory process only has three metal layers available. With the development of the process, the area of the chip with the same capacity is getting smaller and smaller, but the functions that the chip can provide have increased. At the same time, under the requirements of advanced packaging, The number of aluminum pads (Al Pad) required for package bonding is also increasing, so the traditional Nor flash ...