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Vacuum film growth apparatus

A technology of vacuum film and equipment, applied in the field of film growth equipment, can solve the problems of great effort and heavy guide coil weight, etc.

Inactive Publication Date: 2004-08-04
SUMITOMO HEAVY IND LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the heavy weight of the guide coil, it takes a lot of effort to adjust it

Method used

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  • Vacuum film growth apparatus
  • Vacuum film growth apparatus
  • Vacuum film growth apparatus

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Embodiment Construction

[0017] In order to facilitate understanding of the present invention, refer to figure 1 A piece of conventional ion coating equipment is depicted. The ion coating equipment has a sealed vacuum chamber 21 . A plasma beam generator 22 is attached to the vacuum chamber 21 via a guide member 21a. The plasma beam generator 22 can be, for example, a pressure gradient plasma torch. A guide coil 23 is placed outside the guide member 21a for guiding the plasma beam 35 . The plasma beam generator 22 is attached with a first intermediate electrode 24 and a second intermediate electrode 25 . The first and second intermediate electrodes 24 and 25 serve to converge the plasma beam and are arranged concentrically with the plasma beam generator 22 . The first intermediate electrode 24 is provided with a permanent magnet 24a such that its magnetic axis is parallel to the central axis of the plasma beam generator 22. The second intermediate electrode 25 is provided with a coil 25a such tha...

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Abstract

A correction mechanism including a magnetic body (51) is placed at a position between a vacuum chamber (21) and a steering coil (23) and where line of magnetic force generated from the steering coil is present, to correct torsion and / or bias of a plasma beam.

Description

technical field [0001] The invention relates to a thin film growth device. More particularly, the present invention relates to an improved thin film growth apparatus comprising a plasma source and a guide coil for guiding a plasma beam generated by the plasma source into a furnace serving as an anode. Background technique [0002] General vacuum thin film growth equipment using plasma is commonly referred to as ion plating equipment and plasma chemical vapor deposition (CVD) equipment. Existing ion coating equipment includes coating equipment using a pressure gradient plasma source or a hollow cathode discharge (HCD) plasma source using an arc discharge. Such ion coating equipment includes a vacuum chamber, a plasma beam generator (plasma source), a furnace and a lead coil. The vacuum chamber is equipped with a plasma beam generator and the furnace is located in the vacuum chamber as an anode. The guide coil is arranged outside the vacuum chamber, which guides the plasma ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/32C23C16/50H01J37/32
CPCH01J37/3266H01J37/32422C23C14/32
Inventor 酒见俊之田中胜和田俊司荻野悦男
Owner SUMITOMO HEAVY IND LTD