Ozone oxidation process for treatment of water containing azoles and azole-type compounds
Inactive Publication Date: 2015-12-10
INFILCO DEGREMONT INC
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Benefits of technology
The invention provides systems and methods for purifying water without using any ferrous treatment or solid-liquid separation before the ozone oxidation process. Additionally, the systems and methods do not require pH adjustment and can be used with water that includes hydrogen peroxide in the wastewater.
Problems solved by technology
As manufacturing processes in the opto-electronic and semiconductor industries advance, the composition of wastewater generated by such processes has become more complex.
For example, such wastewater may be comprised of both organic carbon compounds and organic nitrogenous compounds, which may be poisonous, corrosive, and eutrophic to the environment.
Triazoles, TMAH, MEA, and DMSO are generally seen as slow biodegradable organic compounds, which during degradation typically release ammonia, resulting in a high ammonia concentration and a potential nitrification in treated wastewater.
However, the increased loading due to the recent growth of the semiconductor industries coupled with more stringent discharge regulations imposed on POTW to remove organic and nitrogen compounds from wastewater may limit the ability of any such POTW to adequately treat such discharge.
However, degradation of azole and azole-related compounds and TMAH has been particularly problematic, in that the presence of the wide variety of triazole and azole-compounds, either accompanied by TMAH or alone, has an adverse and inhibitory impact on nitrification activity.
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[0021]The matters exemplified in this description are provided to assist in a comprehensive understanding of various exemplary embodiments disclosed with reference to the accompanying figures. Accordingly, those of ordinary skill in the art will recognize that various changes and modifications of the exemplary embodiments described herein can be made without departing from the spirit and scope of the claimed invention. Descriptions of well-known functions and constructions are omitted for clarity and conciseness. Moreover, as used herein, the singular may be interpreted in the plural, and alternately, any term in the plural may be interpreted to be in the singular.
[0022]In general, the present invention teaches a chemical treatment system for treating wastewater comprising liquid and solid components, comprising an oxidation module. The oxidation module may receive wastewater that is an output of a production process and output from the oxidation module an effluent. Azole-type compo...
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Abstract
The present invention is generally directed to the use of an ozone oxidation process to remove azoles and azole-type compounds from wastewater. Specifically, the present invention is directed to a chemical treatment system for wastewater, including: an oxidation module receiving wastewater input and outputting an effluent; wherein the oxidation module removes azole-type compounds from the wastewater; and wherein the effluent has a reduction in azole-type compounds greater than ninety percent (90%). In accordance with some embodiments, the present invention provides an oxidation module receiving as inputs: wastewater received from a chemical mechanical polishing process and ozone gas received from an ozone generator; the oxidation module outputting an effluent; wherein the oxidation module removes azole-type compounds from the input wastewater; wherein the effluent has a reduction in azole-type compounds greater than ninety percent (90%); and wherein the oxidation module does not require ferrous treatment or solid-liquid separation before treatment.
Description
BACKGROUND[0001]In general, the present invention is directed to systems and methods of treating wastewater produced by manufacturing processes used to produce electronic components and semiconductor devices. More specifically, the present invention is directed to systems and methods for removing various compounds, such as, but not limited to, the family of azoles and azole-type compounds, which may include: benzotriazole, pyrazole, 4-methyl-1-H-benzotrazole, 5-methyl-1-H-benzotrazole, imidazole, 1,2,4 1H-triazole, 3-amino triazole, tetrazole, oxazole, thiazole, diazoir 1,2,3, thiadiazole, and other azole derivatives that may include compounds comprising a fused azole and benzene ring. Such compound may be removed from wastewater and ‘drag out’ water generated by, for example, plating acid waste in a chemical mechanical polishing (CMP) step that may be used in a fabrication process of semiconductor devices, and / or from a manufacture of opto-electronic components, such as thin-film t...
Claims
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Login to View More IPC IPC(8): C02F1/78
CPCC02F1/78C02F2201/002C02F2103/346C02F2101/38C02F1/725
InventorSCHILLING, BARBARALAU, ANTONIOHEINIGER, BRUNO
OwnerINFILCO DEGREMONT INC