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Gel Nail Polish and Manufacturing and Using Method Thereof

a gel nail and gel technology, applied in the field of gel nail polish, can solve the problems of inconvenient and money-wasting, nail damage and thinning, and the removal process of gel nails is inconvenience and troublesome, and achieves the effects of reducing damage to nails, saving time and money for users, and drying quickly and quickly

Inactive Publication Date: 2018-09-06
ZHEN LIJUAN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

[0009]Another advantage of the invention is to provide a gel nail polish, wherein the removing process of the gel nail polish of the present invention is simple, so that no aluminum foils are needed to wrap around the fingertips, and also no additional auxiliary, such as a cuticle pusher or iron pusher, is needed to pop the gel nail polish layer off the nail.
[0010]Another advantage of the invention is to provide a gel nail polish, wherein no wet sticky colloids will residue on the finished gel nail polish structure after the finished gel nail polish structure is dried, so that the users doesn't need to use alcohol to remove wet sticky colloids on the structure.
[0011]Another advantage of the invention is to provide a gel nail polish, wherein the gel nail polish can be easily and quickly dried after exposing under a light structure, wherein, especially, the light structure can be the natural sunlight.
[0012]Another advantage of the invention is to provide a method of using a gel nail polish, including applying and removing processes of the gel nail polish, which is time-saving and money saving for the user. In other words, the damages for the nails are reduced during the gel nail polish removing process.
[0013]Another advantage of the invention is to provide a gel nail polish, wherein no expensive and complicated structure is required to be employed in the present invention in order to achieve the above mentioned advantages. Therefore, the present invention successfully provides an economic and efficient solution to simplify the applying process and removing process of the gel nail polish.

Problems solved by technology

In other words, each layer cannot be dried under the sunlight, so that it is inconvenience and money-wasting for the users to prepare and purchase the LED light or the UV light device.
Furthermore, the removing process of the soak off gel nails is inconvenience and troublesome.
For such removing process, the user has to spend at least 30 minutes to remove the soak off nail polish layer from their nails, and the nails will be damaged and thinned by frequently using the nail file or nail buffer.

Method used

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  • Gel Nail Polish and Manufacturing and Using Method Thereof
  • Gel Nail Polish and Manufacturing and Using Method Thereof
  • Gel Nail Polish and Manufacturing and Using Method Thereof

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Embodiment Construction

[0040]The following description is disclosed to enable any person skilled in the art to make and use the present invention. Preferred embodiments are provided in the following description only as examples and modifications will be apparent to those skilled in the art. The general principles defined in the following description would be applied to other embodiments, alternatives, modifications, equivalents, and applications without departing from the spirit and scope of the present invention.

[0041]A gel nail polish of the present invention is adapted to being dried under an exposure of light. The user is able to remove the gel nail polish structure by directly wiping off the gel nail polish structure by a rag, cotton, or tissue paper soaked with the nail polish remover without complicated removing process and auxiliary tools as the conventional nail polish removing process.

[0042]The gel nail polish according to the preferred embodiment of the present invention is illustrated, wherein...

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Abstract

A gel nail polish composition includes a gel nail polish mixture and a color agent mixing therewith for forming a gel nail polish layer on a nail of a user. The gel nail polish mixture includes first through fourth chemical elements, wherein the first through fourth chemical elements are aliphatic urethane acrylate, polymer acrylate oligomer, propoxylated neopentyl glycol diacrylate, and trimethylbenzoyl diphenylphosphine oxide. The wipe off base coat layer, the gel nail polish layer, and the top coat layer are dried under an exposure of one of LED light, UV light, and sunlight that no wet sticky colloid is formed after the top coat layer is dried. The gel nail polish layer is adapted for being removed by directly wiping off the gel nail polish layer on the nail by using a rag, cotton, or tissue paper with the nail polish remover.

Description

CROSS REFERENCE OF RELATED APPLICATION[0001]This is a Divisional application that claims the benefit of priority under 35 U.S.C.§ 120 to a non-provisional application, application Ser. No. 14 / 839,926, filed Aug. 29, 2015.NOTICE OF COPYRIGHT[0002]A portion of the disclosure of this patent document contains material which is subject to copyright protection. The copyright owner has no objection to any reproduction by anyone of the patent disclosure, as it appears in the United States Patent and Trademark Office patent files or records, but otherwise reserves all copyright rights whatsoever.BACKGROUND OF THE PRESENT INVENTIONField of Invention[0003]The present invention relates to a gel nail polish, and more particularly to an easily wipeable gel nail polish and its manufacturing and using method, wherein the gel nail polish is dried out easily and can be directly wipe off by the polish remover without a complicate removing process.Description of Related Arts[0004]Gel nail polish is rel...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): A61K8/81A61K8/40A61K8/04A61Q3/02A61K8/87A61K8/37A61K8/34A61K8/36
CPCA61K2800/81A61K2800/95A61K8/40A61K8/042A61Q3/02A61K8/8147A61K2800/596A61K8/87A61K8/375A61K2800/884A61K2800/805A61K8/345A61K8/36A61K2800/882A61K8/85A61K8/8152A45D29/18A61K2800/59
Inventor ZHEN, LIJUAN
Owner ZHEN LIJUAN
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