Red photoresist combination of color light filter used for LCD device and its application

Abstract

The invention discloses a red photoresist composition, which comprises the following components: red pigment, photoactive polymer, photoactive monomer, solvent, photoinitiator, dispersant and additive. Wherein the photoactive polymer as the photosensitive system in the red photoresist composition includes a polythiol-polyene oligomer component, thereby having two mechanisms of free radical polymerization and cationic polymerization, so that the polymerization speed of the photoresist composition is fast when exposed , Good anti-oxygen and polymerization inhibition performance, and has good graphic reproducibility, resolution ability and high transmittance. The application of the red photoresist composition is: the red photoresist composition is spin-coated on a clean substrate, and after drying, ultraviolet exposure, development and baking processes, a red filter with high color purity is formed , and then obtain a color filter and a liquid crystal display through a conventional manufacturing method.

Description

technical field [0001] The invention relates to a pigment photoresist composition of a color filter for a liquid crystal display, in particular to a red photoresist composition of a color filter for a liquid crystal display. Background technique [0002] With the rapid popularization of color liquid crystal display devices, the requirements for display color display are constantly increasing. A general color liquid crystal display device includes a color filter substrate and a thin-film transistor (TFT) substrate facing each other and setting a gap of 1-10 μm, filling the gap with a liquid crystal material, and sealing its periphery with a sealing material such as epoxy resin. . [0003] The structure of the color filter is as follows: sequentially formed on a transparent glass substrate: 1) black matrix to prevent light leakage; 2) red, green and blue primary colors for color display; 3) protective film (this process is optional), its function It is the function of protec...

AI Technical Summary

Problems solved by technology

[0005] The acrylate photocuring system contained in the pigment photoresist used in traditional color filters, because its free radical polymerization mechanism is significantly inhibited by oxygen, often requires an inert protective atmosphere such as nitrogen or an oxygen barrier film during the polymerization process , making the process complicated and adding additional costs and requirements

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