Anhydrous granulating technique of metallurgical slag and device thereof
A technology for metallurgical slag and water particles, which is applied in the field of anhydrous granulation processes and devices, can solve the problems of environmental pollution, deterioration of water system water quality, and high operation and maintenance costs, and achieves the effects of less investment, simple process and convenient operation.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0017] The present invention will be described in detail below in conjunction with the accompanying drawings.
[0018] figure 1 It is a structural schematic diagram of anhydrous granulation device for metallurgical slag or molten matte of the present invention, which is applied to existing metallurgical furnaces, such as figure 1 As shown, the present invention includes a granulation chamber (not shown in the figure), a dispersion device 11 and a cooling water nozzle 12 .
[0019] The inner cavity of the granulation chamber communicates with the slag discharge chute 9, the bottom slag discharge port is opposite to the feed bin (not shown in the figure), and the top is provided with an emptying chimney and an induced draft fan.
[0020] The dispersing device 11 is a dispersing nozzle, which is installed in the granulation chamber and below the outlet of the slag chute 9, which is inclined upwards towards the molten slag flow and has an angle of 0-60° with the horizontal direct...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com